Issued Patents All Time
Showing 1–25 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11101357 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2021-08-24 |
| 11056398 | Forming interconnect without gate cut isolation blocking opening formation | Daniel Jaeger, Naved Siddiqui, Shimpei Yamaguchi | 2021-07-06 |
| 10833160 | Field-effect transistors with self-aligned and non-self-aligned contact openings | Michael V. Aquilino, Daniel Jaeger, Naved Siddiqui, Jessica Dechene, Daniel James Dechene +1 more | 2020-11-10 |
| 10734492 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2020-08-04 |
| 10580686 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2020-03-03 |
| 10381452 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2019-08-13 |
| 10374048 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2019-08-06 |
| 10367072 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2019-07-30 |
| 10242906 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2019-03-26 |
| 10083878 | Fin fabrication process with dual shallow trench isolation and tunable inner and outer fin profile | Brian J. Greene | 2018-09-25 |
| 10074571 | Device with decreased pitch contact to active regions | Brian J. Greene, Scott R. Stiffler | 2018-09-11 |
| 10032862 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2018-07-24 |
| 9922831 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2018-03-20 |
| 9859122 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2018-01-02 |
| 9837319 | Asymmetric high-K dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-12-05 |
| 9812396 | Interconnect structure for semiconductor devices with multiple power rails and redundancy | Jason E. Stephens, Guillaume Bouche, Patrick R. Justison, Byoung Youp Kim, Craig Child | 2017-11-07 |
| 9812324 | Methods to control fin tip placement | Lei Zhuang, Lars Liebmann, Stuart A. Sieg, Fee Li Lie, Mahender Kumar +3 more | 2017-11-07 |
| 9786545 | Method of forming ANA regions in an integrated circuit | Guillaume Bouche, Jason E. Stephens, Byoung Youp Kim, Craig Child | 2017-10-10 |
| 9768195 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2017-09-19 |
| 9768071 | Asymmetric high-K dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-09-19 |
| 9721843 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-08-01 |
| 9698159 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2017-07-04 |
| 9685379 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-06-20 |
| 9659961 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2017-05-23 |
| 9577061 | Asymmetric high-K dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-02-21 |