JS

Jonathan T. Shaw

IBM: 14 patents #8,004 of 70,183Top 15%
TE Tessera: 2 patents #162 of 271Top 60%
Overall (All Time): #294,396 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11101357 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2021-08-24
10734492 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2020-08-04
10381452 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2019-08-13
10374048 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2019-08-06
10367072 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2019-07-30
9922831 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2018-03-20
9859122 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2018-01-02
9837319 Asymmetric high-K dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2017-12-05
9768071 Asymmetric high-K dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2017-09-19
9721843 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2017-08-01
9685379 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2017-06-20
9577061 Asymmetric high-K dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2017-02-21
9570354 Asymmetric high-K dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2017-02-14
9559010 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2017-01-31
9543213 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2017-01-10
9412667 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland 2016-08-09