Issued Patents All Time
Showing 25 most recent of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11043418 | Middle of the line self-aligned direct pattern contacts | Daniel Chanemougame, Ruilong Xie, Lars Liebmann, Gregory A. Northrop | 2021-06-22 |
| 10741439 | Merge mandrel features | Hsueh-Chung Chen, Martin O'Toole, Terry A. Spooner | 2020-08-11 |
| 10559503 | Methods, apparatus and system for a passthrough-based architecture | Guillaume Bouche, Tuhin Guha Neogi, Andy Chi-Hung Wei, Jia Zeng, Jongwook Kye +3 more | 2020-02-11 |
| 10522403 | Middle of the line self-aligned direct pattern contacts | Daniel Chanemougame, Ruilong Xie, Lars Liebmann, Gregory A. Northrop | 2019-12-31 |
| 10340180 | Merge mandrel features | Hsueh-Chung Chen, Martin O'Toole, Terry A. Spooner | 2019-07-02 |
| 10262941 | Devices and methods for forming cross coupled contacts | Guillaume Bouche, Tuhin Guha Neogi, Kai Sun, Deniz E. Civay, David Pritchard +1 more | 2019-04-16 |
| 10236350 | Method, apparatus and system for a high density middle of line flow | Guillaume Bouche, Tuhin Guha Neogi, Sudharshanan Raghunathan, Andy Chi-Hung Wei, Vikrant Chauhan +1 more | 2019-03-19 |
| 10181420 | Devices with chamfer-less vias multi-patterning and methods for forming chamfer-less vias | David Permana, Guillaume Bouche, Andy Wei, Mark A. Zaleski, Anbu Selvam K M Mahalingam +6 more | 2019-01-15 |
| 10056373 | Transistor contacts self-aligned in two dimensions | Andy Wei, Guillaume Bouche, Mark A. Zaleski, Tuhin Guha Neogi, Jongwook Kye +1 more | 2018-08-21 |
| 9852986 | Method of patterning pillars to form variable continuity cuts in interconnection lines of an integrated circuit | Guillaume Bouche | 2017-12-26 |
| 9825031 | Methods of forming a high-k contact liner to improve effective via separation distance and the resulting devices | Guillaume Bouche, Andy Wei, David Permana, Jagannathan Vasudevan | 2017-11-21 |
| 9818651 | Methods, apparatus and system for a passthrough-based architecture | Guillaume Bouche, Tuhin Guha Neogi, Andy Chi-Hung Wei, Jia Zeng, Jongwook Kye +3 more | 2017-11-14 |
| 9818623 | Method of forming a pattern for interconnection lines and associated continuity blocks in an integrated circuit | Guillaume Bouche, Byoung Youp Kim, Craig Child | 2017-11-14 |
| 9818640 | Apparatus and method of forming self-aligned cuts in a non-mandrel line of an array of metal lines | Guillaume Bouche | 2017-11-14 |
| 9818641 | Apparatus and method of forming self-aligned cuts in mandrel and a non-mandrel lines of an array of metal lines | Guillaume Bouche | 2017-11-14 |
| 9812396 | Interconnect structure for semiconductor devices with multiple power rails and redundancy | Guillaume Bouche, Shreesh Narasimha, Patrick R. Justison, Byoung Youp Kim, Craig Child | 2017-11-07 |
| 9786545 | Method of forming ANA regions in an integrated circuit | Guillaume Bouche, Byoung Youp Kim, Craig Child, Shreesh Narasimha | 2017-10-10 |
| 9779943 | Compensating for lithographic limitations in fabricating semiconductor interconnect structures | Guillaume Bouche | 2017-10-03 |
| 9691626 | Method of forming a pattern for interconnection lines in an integrated circuit wherein the pattern includes gamma and beta block mask portions | Guillaume Bouche | 2017-06-27 |
| 9660040 | Transistor contacts self-aligned two dimensions | Andy Wei, Guillaume Bouche, Mark A. Zaleski, Tuhin Guha Neogi, Jongwook Kye +1 more | 2017-05-23 |
| 9576735 | Vertical capacitors with spaced conductive lines | Roderick A. Augur | 2017-02-21 |
| 9530689 | Methods for fabricating integrated circuits using multi-patterning processes | Deniz E. Civay, Jiong Li, Guillaume Bouche, Richard A. Farrell | 2016-12-27 |
| 9502528 | Borderless contact formation through metal-recess dual cap integration | Guillaume Bouche, Tuhin Guha Neogi, Mark A. Zaleski, Andy Wei | 2016-11-22 |
| 9472455 | Methods of cross-coupling line segments on a wafer | Lei Yuan, Lixia Lei, David Pritchard, Tuhin Guha Neogi | 2016-10-18 |
| 9465907 | Multi-polygon constraint decomposition techniques for use in double patterning applications | Ahmed Hassan, Nader Magdy Hindawy, Vikrant Chauhan, David Pritchard, Abbas Guvenilir +2 more | 2016-10-11 |