SR

Sudharshanan Raghunathan

Globalfoundries: 9 patents #393 of 4,424Top 9%
AB Asml Netherlands B.V.: 3 patents #1,156 of 3,192Top 40%
IBM: 1 patents #44,794 of 70,183Top 65%
📍 Fremont, CA: #1,349 of 9,298 inventorsTop 15%
🗺 California: #46,935 of 386,348 inventorsTop 15%
Overall (All Time): #365,555 of 4,157,543Top 9%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
12386268 Method for calibrating simulation process based on defect-based process window Koenraad VAN INGEN SCHENAU, Abraham SLACHTER, Vadim Yourievich TIMOSHKOV, Marleen KOOIMAN, Marie-Claire VAN LARE +5 more 2025-08-12
10962887 Lithographic method Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Boris Menchtchikov, Ahmet Koray Erdamar +13 more 2021-03-30
10559503 Methods, apparatus and system for a passthrough-based architecture Guillaume Bouche, Tuhin Guha Neogi, Andy Chi-Hung Wei, Jia Zeng, Jongwook Kye +3 more 2020-02-11
10527958 Lithographic method Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Boris Menchtchikov, Ahmet Koray Erdamar +13 more 2020-01-07
10236350 Method, apparatus and system for a high density middle of line flow Guillaume Bouche, Tuhin Guha Neogi, Andy Chi-Hung Wei, Jason E. Stephens, Vikrant Chauhan +1 more 2019-03-19
9852984 Cut first alternative for 2D self-aligned via Guillaume Bouche, Andy Wei 2017-12-26
9818651 Methods, apparatus and system for a passthrough-based architecture Guillaume Bouche, Tuhin Guha Neogi, Andy Chi-Hung Wei, Jia Zeng, Jongwook Kye +3 more 2017-11-14
9478506 Multilayer pattern transfer for chemical guides Richard A. Farrell, Gerard Schmid 2016-10-25
9425097 Cut first alternative for 2D self-aligned via Guillaume Bouche, Andy Wei 2016-08-23
9362165 2D self-aligned via first process flow Guillaume Bouche, Andy Wei 2016-06-07
8956789 Methods for fabricating integrated circuits including multi-patterning of masks for extreme ultraviolet lithography 2015-02-17
8911920 Methods for fabricating EUV masks and methods for fabricating integrated circuits using such EUV masks Pawitter S. Mangat, Hui Peng Koh 2014-12-16
8673165 Sidewall image transfer process with multiple critical dimensions Sivananda K. Kanakasabapathy, Ryan O. Jung, Allen H. Gabor, Sean D. Burns, Erin Catherine McLellan 2014-03-18