Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12339521 | Eyeglasses with associated true wireless earbuds | James Jacobs, Kyle Edward Arnett | 2025-06-24 |
| RE48968 | Wireless earbuds and related methods | James Milam, Peter M. Kelly, David G. Vogt, Jr., Steve Page | 2022-03-08 |
| 10957544 | Gate cut with high selectivity to preserve interlevel dielectric layer | Andrew M. Greene, Ruilong Xie | 2021-03-23 |
| D908114 | Earbud headset | Mike Jacobs, Eran Vautour | 2021-01-19 |
| D907597 | Earbud headset | Mike Jacobs, Eran Vautour | 2021-01-12 |
| D899399 | Earbud headset | Mike Jacobs, Eran Vautour | 2020-10-20 |
| 10629698 | Method and structure for enabling high aspect ratio sacrificial gates | Kangguo Cheng, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre, Sean Teehan | 2020-04-21 |
| 10586706 | Gate cut with high selectivity to preserve interlevel dielectric layer | Andrew M. Greene, Ruilong Xie | 2020-03-10 |
| D877721 | Pair of earbud headsets | — | 2020-03-10 |
| D869432 | Headphone | — | 2019-12-10 |
| D868731 | Headphone | — | 2019-12-03 |
| 10446452 | Method and structure for enabling controlled spacer RIE | Kangguo Cheng, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer, John R. Sporre +1 more | 2019-10-15 |
| 9900680 | Wireless earbuds and related methods | James Milam, Peter M. Kelly, David G. Vogt, Jr., Steve Page | 2018-02-20 |
| 9842739 | Method and structure for enabling high aspect ratio sacrificial gates | Kangguo Cheng, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre, Sean Teehan | 2017-12-12 |
| 9837276 | Gate cut with high selectivity to preserve interlevel dielectric layer | Andrew M. Greene, Ruilong Xie | 2017-12-05 |
| 9786666 | Method to form dual channel semiconductor material fins | Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan | 2017-10-10 |
| 9659779 | Method and structure for enabling high aspect ratio sacrificial gates | Kangguo Cheng, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre, Sean Teehan | 2017-05-23 |
| 9659786 | Gate cut with high selectivity to preserve interlevel dielectric layer | Andrew M. Greene, Ruilong Xie | 2017-05-23 |
| 9627277 | Method and structure for enabling controlled spacer RIE | Kangguo Cheng, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer, John R. Sporre +1 more | 2017-04-18 |
| 9601335 | Trench formation for dielectric filled cut region | Andrew M. Greene, Ruilong Xie, Peng Xu | 2017-03-21 |
| 9601366 | Trench formation for dielectric filled cut region | Andrew M. Greene, Ruilong Xie, Peng Xu | 2017-03-21 |
| 9530864 | Junction overlap control in a semiconductor device using a sacrificial spacer layer | Steven Bentley, Michael Hargrove, Chia-Yu Chen, Sivanandha K. Kanakasabapathy, Tenko Yamashita | 2016-12-27 |
| 9466505 | Methods of patterning features having differing widths | Linus Jang, Soon-Cheon Seo | 2016-10-11 |
| 9362179 | Method to form dual channel semiconductor material fins | Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan | 2016-06-07 |
| 9318347 | Wafer backside particle mitigation | Marc A. Bergendahl, James J. Demarest, Alex Richard Hubbard, Richard C. Johnson, James J. Kelly +3 more | 2016-04-19 |