| 12278125 |
Integrated dry processes for patterning radiation photoresist patterning |
Jengyi Yu, Samantha Tan, Mohammed Haroon Alvi, Richard Wise, Yang Pan +5 more |
2025-04-15 |
|
| 12183604 |
Integrated dry processes for patterning radiation photoresist patterning |
Jengyi Yu, Samantha Tan, Mohammed Haroon Alvi, Richard Wise, Yang Pan +5 more |
2024-12-31 |
$116,387,000 |
| 12183589 |
Tin oxide mandrels in patterning |
Jengyi Yu, Samantha Tan, Seongjun Heo, Boris Volosskiy, Richard Wise +2 more |
2024-12-31 |
$116,387,000 |
| RE50174 |
Structure and process to tuck fin tips self-aligned to gates |
Bruce B. Doris, Hong He, Gauri Karve, Fee Li Lie, Derrick Liu +2 more |
2024-10-15 |
|
| 12106963 |
Self aligned pattern formation post spacer etchback in tight pitch configurations |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Christopher J. Penny +2 more |
2024-10-01 |
$10,915,000 |
| 11987876 |
Chamfer-less via integration scheme |
Hui-Jung Wu, Richard Wise, Arpan Mahorowala |
2024-05-21 |
$220,329,000 |
| 11894462 |
Forming a sacrificial liner for dual channel devices |
Huiming Bu, Kangguo Cheng, Dechao Guo, Peng Xu |
2024-02-06 |
|
| 11670510 |
Self aligned pattern formation post spacer etchback in tight pitch configurations |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Christopher J. Penny +2 more |
2023-06-06 |
$11,771,000 |
| 11646221 |
Self-aligned pattern formation for a semiconductor device |
Sean D. Burns, Lawrence A. Clevenger, Nelson Felix, Christopher J. Penny, Nicole Saulnier |
2023-05-09 |
$3,203,000 |
| 11355353 |
Tin oxide mandrels in patterning |
Jengyi Yu, Samantha Tan, Seongjun Heo, Boris Volosskiy, Richard Wise +2 more |
2022-06-07 |
$171,038,000 |
| 11315922 |
Fin cut to prevent replacement gate collapse on STI |
Andrew M. Greene, Balasubramanian Pranatharthiharan, John R. Sporre |
2022-04-26 |
$5,083,000 |
| 11276767 |
Additive core subtractive liner for metal cut etch processes |
Ruqiang Bao, Kisup Chung, Andrew M. Greene, David L. Rath, Indira Seshadri +1 more |
2022-03-15 |
$4,817,000 |
| 11227793 |
Self-aligned pattern formation for a semiconductor device |
Sean D. Burns, Lawrence A. Clevenger, Nelson Felix, Christopher J. Penny, Nicole Saulnier |
2022-01-18 |
$5,274,000 |
| 11189729 |
Forming a sacrificial liner for dual channel devices |
Huiming Bu, Kangguo Cheng, Dechao Guo, Peng Xu |
2021-11-30 |
$13,665,000 |
| 11152489 |
Additive core subtractive liner for metal cut etch processes |
Ruqiang Bao, Kisup Chung, Andrew M. Greene, David L. Rath, Indira Seshadri +1 more |
2021-10-19 |
$2,168,000 |
| 11145658 |
Semiconductor structures with deep trench capacitor and methods of manufacture |
Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodorus E. Standaert +1 more |
2021-10-12 |
$3,967,000 |
| 11107821 |
Semiconductor structures with deep trench capacitor and methods of manufacture |
Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodoras E. Standaert +1 more |
2021-08-31 |
$6,618,000 |
| 11094824 |
Forming a sacrificial liner for dual channel devices |
Huiming Bu, Kangguo Cheng, Dechao Guo, Peng Xu |
2021-08-17 |
$20,526,000 |
| 11081566 |
Self-aligned contacts for vertical field effect transistors |
Su Chen Fan, Ekmini Anuja De Silva |
2021-08-03 |
$4,187,000 |
| 11075281 |
Additive core subtractive liner for metal cut etch processes |
Ruqiang Bao, Kisup Chung, Andrew M. Greene, David L. Rath, Indira Seshadri +1 more |
2021-07-27 |
$4,187,000 |
| 11056493 |
Semiconductor structures with deep trench capacitor and methods of manufacture |
Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodorus E. Standaert +1 more |
2021-07-06 |
$5,313,000 |
| 11018007 |
Self aligned pattern formation post spacer etchback in tight pitch configurations |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Christopher J. Penny +2 more |
2021-05-25 |
$24,728,000 |
| 10957583 |
Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Yann Mignot, Christopher J. Penny +2 more |
2021-03-23 |
$2,115,000 |
| 10957694 |
Epitaxial oxide fin segments to prevent strained semiconductor fin end relaxation |
Karthik Balakrishnan, Keith E. Fogel, Alexander Reznicek |
2021-03-23 |
$2,115,000 |
| 10937867 |
Conformal doping for punch through stopper in fin field effect transistor devices |
Huiming Bu, Fee Li Lie, Tenko Yamashita |
2021-03-02 |
$2,720,000 |
