Issued Patents All Time
Showing 25 most recent of 204 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12278125 | Integrated dry processes for patterning radiation photoresist patterning | Jengyi Yu, Samantha Tan, Mohammed Haroon Alvi, Richard Wise, Yang Pan +5 more | 2025-04-15 |
| 12183604 | Integrated dry processes for patterning radiation photoresist patterning | Jengyi Yu, Samantha Tan, Mohammed Haroon Alvi, Richard Wise, Yang Pan +5 more | 2024-12-31 |
| 12183589 | Tin oxide mandrels in patterning | Jengyi Yu, Samantha Tan, Seongjun Heo, Boris Volosskiy, Richard Wise +2 more | 2024-12-31 |
| RE50174 | Structure and process to tuck fin tips self-aligned to gates | Bruce B. Doris, Hong He, Gauri Karve, Fee Li Lie, Derrick Liu +2 more | 2024-10-15 |
| 12106963 | Self aligned pattern formation post spacer etchback in tight pitch configurations | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Christopher J. Penny +2 more | 2024-10-01 |
| 11987876 | Chamfer-less via integration scheme | Hui-Jung Wu, Richard Wise, Arpan Mahorowala | 2024-05-21 |
| 11894462 | Forming a sacrificial liner for dual channel devices | Huiming Bu, Kangguo Cheng, Dechao Guo, Peng Xu | 2024-02-06 |
| 11670510 | Self aligned pattern formation post spacer etchback in tight pitch configurations | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Christopher J. Penny +2 more | 2023-06-06 |
| 11646221 | Self-aligned pattern formation for a semiconductor device | Sean D. Burns, Lawrence A. Clevenger, Nelson Felix, Christopher J. Penny, Nicole Saulnier | 2023-05-09 |
| 11355353 | Tin oxide mandrels in patterning | Jengyi Yu, Samantha Tan, Seongjun Heo, Boris Volosskiy, Richard Wise +2 more | 2022-06-07 |
| 11315922 | Fin cut to prevent replacement gate collapse on STI | Andrew M. Greene, Balasubramanian Pranatharthiharan, John R. Sporre | 2022-04-26 |
| 11276767 | Additive core subtractive liner for metal cut etch processes | Ruqiang Bao, Kisup Chung, Andrew M. Greene, David L. Rath, Indira Seshadri +1 more | 2022-03-15 |
| 11227793 | Self-aligned pattern formation for a semiconductor device | Sean D. Burns, Lawrence A. Clevenger, Nelson Felix, Christopher J. Penny, Nicole Saulnier | 2022-01-18 |
| 11189729 | Forming a sacrificial liner for dual channel devices | Huiming Bu, Kangguo Cheng, Dechao Guo, Peng Xu | 2021-11-30 |
| 11152489 | Additive core subtractive liner for metal cut etch processes | Ruqiang Bao, Kisup Chung, Andrew M. Greene, David L. Rath, Indira Seshadri +1 more | 2021-10-19 |
| 11145658 | Semiconductor structures with deep trench capacitor and methods of manufacture | Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodorus E. Standaert +1 more | 2021-10-12 |
| 11107821 | Semiconductor structures with deep trench capacitor and methods of manufacture | Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodoras E. Standaert +1 more | 2021-08-31 |
| 11094824 | Forming a sacrificial liner for dual channel devices | Huiming Bu, Kangguo Cheng, Dechao Guo, Peng Xu | 2021-08-17 |
| 11081566 | Self-aligned contacts for vertical field effect transistors | Su Chen Fan, Ekmini Anuja De Silva | 2021-08-03 |
| 11075281 | Additive core subtractive liner for metal cut etch processes | Ruqiang Bao, Kisup Chung, Andrew M. Greene, David L. Rath, Indira Seshadri +1 more | 2021-07-27 |
| 11056493 | Semiconductor structures with deep trench capacitor and methods of manufacture | Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodorus E. Standaert +1 more | 2021-07-06 |
| 11018007 | Self aligned pattern formation post spacer etchback in tight pitch configurations | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Christopher J. Penny +2 more | 2021-05-25 |
| 10957694 | Epitaxial oxide fin segments to prevent strained semiconductor fin end relaxation | Karthik Balakrishnan, Keith E. Fogel, Alexander Reznicek | 2021-03-23 |
| 10957583 | Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Yann Mignot, Christopher J. Penny +2 more | 2021-03-23 |
| 10937867 | Conformal doping for punch through stopper in fin field effect transistor devices | Huiming Bu, Fee Li Lie, Tenko Yamashita | 2021-03-02 |