Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11990342 | Metal cut patterning and etching to minimize interlayer dielectric layer loss | Ekmini Anuja De Silva, Andrew M. Greene, Siva Kanakasabapathy, Indira Seshadri | 2024-05-21 |
| 11476415 | Patterning magnetic tunnel junctions and the like while reducing detrimental resputtering of underlying features | Michael Rizzolo, Fee Li Lie | 2022-10-18 |
| 11276767 | Additive core subtractive liner for metal cut etch processes | Ruqiang Bao, Andrew M. Greene, Sivananda K. Kanakasabapathy, David L. Rath, Indira Seshadri +1 more | 2022-03-15 |
| 11152489 | Additive core subtractive liner for metal cut etch processes | Ruqiang Bao, Andrew M. Greene, Sivananda K. Kanakasabapathy, David L. Rath, Indira Seshadri +1 more | 2021-10-19 |
| 11133189 | Metal cut patterning and etching to minimize interlayer dielectric layer loss | Ekmini Anuja De Silva, Andrew M. Greene, Siva Kanakasabapathy, Indira Seshadri | 2021-09-28 |
| 11075281 | Additive core subtractive liner for metal cut etch processes | Ruqiang Bao, Andrew M. Greene, Sivananda K. Kanakasabapathy, David L. Rath, Indira Seshadri +1 more | 2021-07-27 |
| 10978550 | Efficient metal-insulator-metal capacitor | Isabel C. Estrada-Raygoza, Hemanth Jagannathan, Chi-Chun Liu, Yann Mignot, Hao Tang | 2021-04-13 |
| 10748962 | Method and structure for forming MRAM device | Soon-Cheon Seo, Seyoung Kim, Injo Ok, Choonghyun Lee | 2020-08-18 |
| 10734234 | Metal cut patterning and etching to minimize interlayer dielectric layer loss | Ekmini Anuja De Silva, Andrew M. Greene, Siva Kanakasabapathy, Indira Seshadri | 2020-08-04 |
| 10714683 | Multilayer hardmask for high performance MRAM devices | Michael Rizzolo, Daniel C. Edelstein, Theodorus E. Standaert, Isabel Cristina Chu, John C. Arnold | 2020-07-14 |
| 10693059 | MTJ stack etch using IBE to achieve vertical profile | Soon-Cheon Seo, Injo Ok, Seyoung Kim, Choonghyun Lee | 2020-06-23 |
| 10680169 | Multilayer hardmask for high performance MRAM devices | Michael Rizzolo, Daniel C. Edelstein, Theodorus E. Standaert, Isabel Cristina Chu, John C. Arnold | 2020-06-09 |
| 10651266 | Efficient metal-insulator-metal capacitor | Isabel C. Estrada-Raygoza, Hemanth Jagannathan, Chi-Chun Liu, Yann Mignot, Hao Tang | 2020-05-12 |
| 10600884 | Additive core subtractive liner for metal cut etch processes | Ruqiang Bao, Andrew M. Greene, Sivananda K. Kanakasabapathy, David L. Rath, Indira Seshadri +1 more | 2020-03-24 |
| 10256289 | Efficient metal-insulator-metal capacitor fabrication | Isabel C. Estrada-Raygoza, Hemanth Jagannathan, Chi-Chun Liu, Yann Mignot, Hao Tang | 2019-04-09 |
| 10217839 | Field effect transistor (FET) with a gate having a recessed work function metal layer and method of forming the FET | Chanro Park, Victor Chan, Koji Watanabe | 2019-02-26 |
| 10090378 | Efficient metal-insulator-metal capacitor | Isabel C. Estrada-Raygoza, Hemanth Jagannathan, Chi-Chun Liu, Yann Mignot, Hao Tang | 2018-10-02 |
| 9881842 | Wimpy and nominal semiconductor device structures for vertical finFETs | Su Chen Fan, Catherine B. Labelle, Xin Miao | 2018-01-30 |
| 9589850 | Method for controlled recessing of materials in cavities in IC devices | Chanro Park, Sivananda K. Kanakasabapathy | 2017-03-07 |