Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE50613 | FinFET gate cut after dummy gate removal | John R. Sporre, Andrew M. Greene, Jeffrey C. Shearer, Nicole Saulnier | 2025-09-30 |
| 12248252 | Bubble defect reduction | Akhil Singhal, Bart J. van Schravendijk, Girish Dixit, David Charles Smith | 2025-03-11 |
| 12191125 | Removing metal contamination from surfaces of a processing chamber | Jengyi Yu, Samantha Tan, Seongjun Heo, Ge Yuan | 2025-01-07 |
| 11990342 | Metal cut patterning and etching to minimize interlayer dielectric layer loss | Kisup Chung, Ekmini Anuja De Silva, Andrew M. Greene, Indira Seshadri | 2024-05-21 |
| 11842888 | Removing metal contamination from surfaces of a processing chamber | Jengyi Yu, Samantha Tan, Seongjun Heo, Ge Yuan | 2023-12-12 |
| 11133189 | Metal cut patterning and etching to minimize interlayer dielectric layer loss | Kisup Chung, Ekmini Anuja De Silva, Andrew M. Greene, Indira Seshadri | 2021-09-28 |
| 11054250 | Multi-channel overlay metrology | Gangadhara Raja Muthinti, Chiew-Seng Koay, Nelson Felix | 2021-07-06 |
| 11024715 | FinFET gate cut after dummy gate removal | John R. Sporre, Andrew M. Greene, Jeffrey C. Shearer, Nicole Saulnier | 2021-06-01 |
| 10741660 | Nanosheet single gate (SG) and extra gate (EG) field effect transistor (FET) co-integration | Nicolas Loubet, Kangguo Cheng, Jingyun Zhang | 2020-08-11 |
| 10734234 | Metal cut patterning and etching to minimize interlayer dielectric layer loss | Kisup Chung, Ekmini Anuja De Silva, Andrew M. Greene, Indira Seshadri | 2020-08-04 |
| 10692990 | Gate cut in RMG | Ruqiang Bao, Andrew M. Greene | 2020-06-23 |
| 10644129 | Gate cut in RMG | Ruqiang Bao, Andrew M. Greene | 2020-05-05 |
| 10622482 | Gate cut using selective deposition to prevent oxide loss | Andrew M. Greene, Ekmini Anuja De Silva | 2020-04-14 |
| 10600868 | FinFET gate cut after dummy gate removal | John R. Sporre, Andrew M. Greene, Jeffrey C. Shearer, Nicole Saulnier | 2020-03-24 |
| 10553700 | Gate cut in RMG | Ruqiang Bao, Andrew M. Greene | 2020-02-04 |
| 10504798 | Gate cut in replacement metal gate process | Ruilong Xie, Chanro Park, Laertis Economikos, Andrew M. Greene, John R. Sporre | 2019-12-10 |
| 10347540 | Gate cut using selective deposition to prevent oxide loss | Andrew M. Greene, Ekmini Anuja De Silva | 2019-07-09 |
| 10229854 | FinFET gate cut after dummy gate removal | John R. Sporre, Andrew M. Greene, Jeffrey C. Shearer, Nicole Saulnier | 2019-03-12 |
| 10167558 | Phase shifted gas delivery for high throughput and cost effectiveness associated with atomic layer etching and atomic layer deposition | Fee Li Lie, Eric R. Miller, Hyung Joo Shin | 2019-01-01 |
| 9627263 | Stop layer through ion implantation for etch stop | Hong He, Yunpeng Yin, Chiahsun Tseng, Junli Wang | 2017-04-18 |
| 7820552 | Advanced high-k gate stack patterning and structure containing a patterned high-k gate stack | Ying Zhang, Edmund M. Sikorski, Hongwen Yan, Vijay Narayanan, Vamsi K. Paruchuri +1 more | 2010-10-26 |
| 6676800 | Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation | John J. Festa, Darryl A. Bennett, Joel Brad Bailey, Lawrence J. Overzet, Marwan H. Khater | 2004-01-13 |