Issued Patents All Time
Showing 25 most recent of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10566454 | Self-aligned contact process enabled by low temperature | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2020-02-18 |
| 10529858 | FinFET with merge-free fins | Hong He, Junli Wang, Chun-Chen Yeh, Yunpeng Yin | 2020-01-07 |
| 10217696 | Non-bridging contact via structures in proximity | Jin Liu, Lei Zhuang | 2019-02-26 |
| 10170327 | Fin density control of multigate devices through sidewall image transfer processes | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2019-01-01 |
| 10170471 | Bulk fin formation with vertical fin sidewall profile | Kangguo Cheng, Hong He, Sivananda K. Kanakasabapathy, Yunpeng Yin | 2019-01-01 |
| 10037944 | Self-aligned contact process enabled by low temperature | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2018-07-31 |
| 10020303 | Methods for forming FinFETs having epitaxial Si S/D extensions with flat top surfaces on a SiGe seed layer | Hong He, Shogo Mochizuki, Chun-Chen Yeh, Yunpeng Yin | 2018-07-10 |
| 9997367 | Non-lithographic line pattern formation | David V. Horak, Chun-Chen Yeh, Yunpeng Yin | 2018-06-12 |
| 9991258 | FinFETs with non-merged epitaxial S/D extensions having a SiGe seed layer on insulator | Hong He, Shogo Mochizuki, Chun-Chen Yeh, Yunpeng Yin | 2018-06-05 |
| 9991255 | FinFETs with non-merged epitaxial S/D extensions on a seed layer and having flat top surfaces | Hong He, Shogo Mochizuki, Chun-Chen Yeh, Yunpeng Yin | 2018-06-05 |
| 9985030 | FinFET semiconductor device having integrated SiGe fin | Kangguo Cheng, Hong He, Ali Khakifirooz, Chun-Chen Yeh, Yunpeng Yin | 2018-05-29 |
| 9947791 | FinFET with merge-free fins | Hong He, Junli Wang, Chun-Chen Yeh, Yunpeg Yin | 2018-04-17 |
| 9941191 | Non-bridging contact via structures in proximity | Jin Liu, Lei Zhuang | 2018-04-10 |
| 9728534 | Densely spaced fins for semiconductor fin field effect transistors | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2017-08-08 |
| 9728419 | Fin density control of multigate devices through sidewall image transfer processes | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2017-08-08 |
| 9646929 | Making an efuse | Hsueh-Chung Chen, Chun-Chen Yeh, Ailian Zhao | 2017-05-09 |
| 9634117 | Self-aligned contact process enabled by low temperature | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2017-04-25 |
| 9634000 | Partially isolated fin-shaped field effect transistors | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2017-04-25 |
| 9627263 | Stop layer through ion implantation for etch stop | Hong He, Siva Kanakasabapathy, Yunpeng Yin, Junli Wang | 2017-04-18 |
| 9583585 | Gate structure integration scheme for fin field effect transistors | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2017-02-28 |
| 9552988 | Tone inverted directed self-assembly (DSA) fin patterning | Hong He, Chi-Chun Liu, Alexander Reznicek, Tenko Yamashita | 2017-01-24 |
| 9543407 | Low-K spacer for RMG finFET formation | Hong He, Tenko Yamashita, Chun-Chen Yeh, Yunpeng Yin | 2017-01-10 |
| 9515089 | Bulk fin formation with vertical fin sidewall profile | Kangguo Cheng, Hong He, Sivananda K. Kanakasabapathy, Yunpeng Yin | 2016-12-06 |
| 9508713 | Densely spaced fins for semiconductor fin field effect transistors | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2016-11-29 |
| 9484440 | Methods for forming FinFETs with non-merged epitaxial fin extensions | Hong He, Shogo Mochizuki, Chun-Chen Yeh, Yunpeng Yin | 2016-11-01 |