Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9396957 | Non-lithographic line pattern formation | David V. Horak, Chun-Chen Yeh, Yunpeng Yin | 2016-07-19 |
| 9391155 | Gate structure integration scheme for fin field effect transistors | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2016-07-12 |
| 9385123 | STI region for small fin pitch in FinFET devices | Hsueh-Chung Chen, Su Chen Fan, Chun-Chen Yeh | 2016-07-05 |
| 9368350 | Tone inverted directed self-assembly (DSA) fin patterning | Hong He, Chi-Chun Liu, Alexander Reznicek, Tenko Yamashita | 2016-06-14 |
| 9330962 | Non-lithographic hole pattern formation | David V. Horak, Chun-Chen Yeh, Yunpeng Yin | 2016-05-03 |
| 9324830 | Self-aligned contact process enabled by low temperature | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2016-04-26 |
| 9293345 | Sidewall image transfer with a spin-on hardmask | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2016-03-22 |
| 9252243 | Gate structure integration scheme for fin field effect transistors | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2016-02-02 |
| 9245788 | Non-bridging contact via structures in proximity | Jin Liu, Lei Zhuang | 2016-01-26 |
| 9099401 | Sidewall image transfer with a spin-on hardmask | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2015-08-04 |
| 9093326 | Electrically isolated SiGe fin formation by local oxidation | Kangguo Cheng, Hong He, Yunpeng Yin | 2015-07-28 |
| 9076733 | Self-aligned trench over fin | Chun-Chen Yeh, Yunpeng Yin, Lei Zhuang | 2015-07-07 |
| 9064813 | Trench patterning with block first sidewall image transfer | Sivananda K. Kanakasabapathy, Yongan Xu, Yunpeng Yin | 2015-06-23 |
| 9064901 | Fin density control of multigate devices through sidewall image transfer processes | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2015-06-23 |
| 9059002 | Non-merged epitaxially grown MOSFET devices | Hong He, Shogo Mochizuki, Chun-Chen Yeh, Yunpeng Yin | 2015-06-16 |
| 9059019 | Semiconductor device including source/drain formed on bulk and gate channel formed on oxide layer | Hong He, Junli Wang, Yunpeng Yin | 2015-06-16 |
| 9053965 | Partially isolated Fin-shaped field effect transistors | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2015-06-09 |
| 9054020 | Double density semiconductor fins and method of fabrication | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2015-06-09 |
| 9054156 | Non-lithographic hole pattern formation | David V. Horak, Chun-Chen Yeh, Yunpeng Yin | 2015-06-09 |
| 9041094 | Finfet formed over dielectric | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2015-05-26 |
| 8969213 | Non-lithographic line pattern formation | David V. Horak, Chun-Chen Yeh, Yunpeng Yin | 2015-03-03 |
| 8969189 | Contact structure employing a self-aligned gate cap | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2015-03-03 |
| 8957478 | Semiconductor device including source/drain formed on bulk and gate channel formed on oxide layer | Hong He, Junli Wang, Yunpeng Yin | 2015-02-17 |
| 8951850 | FinFET formed over dielectric | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2015-02-10 |
| 8872244 | Contact structure employing a self-aligned gate cap | Hong He, Chun-Chen Yeh, Yunpeng Yin | 2014-10-28 |