Issued Patents All Time
Showing 1–25 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12374552 | Methods for preparing small features on a substrate | Wei-Hao Wu, Ludovic Godet | 2025-07-29 |
| 12327730 | Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic | Fee Li Lie, Dongbing Shao, Robert C. Wong | 2025-06-10 |
| 12225641 | Bake devices for handling and uniform baking of substrates | Hiram Cervera, Ludovic Godet | 2025-02-11 |
| 12159392 | Die system and method of comparing alignment vectors | Chan Juan XING, Jinxin FU, Yifei Wang, Ludovic Godet | 2024-12-03 |
| 12153344 | Lithography method to form structures with slanted angle | Jinxin FU, Jhenghan YANG, Ludovic Godet | 2024-11-26 |
| 12111572 | Methods of greytone imprint lithography to fabricate optical devices | Hao Tang, Kang Luo, Erica Chen | 2024-10-08 |
| 12094774 | Back-end-of-line single damascene top via spacer defined by pillar mandrels | Yann Mignot, Hsueh-Chung Chen | 2024-09-17 |
| 12085475 | Method to determine line angle and rotation of multiple patterning | Chan Juan XING, Jinxin FU, Ludovic Godet | 2024-09-10 |
| 12087601 | Reducing line edge roughness and mitigating defects by wafer freezing | Karen E. Petrillo, Jennifer Fullam | 2024-09-10 |
| 12060297 | Methods and apparatus of processing transparent substrates | Chien-An Chen, Ludovic Godet | 2024-08-13 |
| 12021102 | Imaging system and method of creating composite images | Jinxin FU, Ludovic Godet, Naamah ARGAMAN, Robert Jan Visser | 2024-06-25 |
| 11977246 | Mask orientation | Rutger Meyer Timmerman Thijssen, Jinrui GUO, Ludovic Godet | 2024-05-07 |
| 11978639 | Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic | Fee Li Lie, Dongbing Shao, Robert C. Wong | 2024-05-07 |
| 11815823 | Alignment mark for front to back side alignment and lithography for optical device fabrication | Ludovic Godet | 2023-11-14 |
| 11784120 | Metal via structure | Yann Mignot, James J. Kelly, Muthumanickam Sankarapandian, Hsueh-Chung Chen, Daniel J. Vincent | 2023-10-10 |
| 11754919 | Lithography method to form structures with slanted angle | Jinxin FU, Jhenghan YANG, Ludovic Godet | 2023-09-12 |
| 11709423 | Methods of greytone imprint lithography to fabricate optical devices | Hao Tang, Kang Luo, Erica Chen | 2023-07-25 |
| 11699591 | Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic | Fee Li Lie, Dongbing Shao, Robert C. Wong | 2023-07-11 |
| 11669012 | Maskless lithography method to fabricate topographic substrate | Ludovic Godet | 2023-06-06 |
| 11630251 | Mask orientation | Rutger Meyer Timmerman Thijssen, Jinrui GUO, Ludovic Godet | 2023-04-18 |
| 11610925 | Imaging system and method of creating composite images | Jinxin FU, Ludovic Godet, Naamah ARGAMAN, Robert Jan Visser | 2023-03-21 |
| 11572619 | Method of thin film deposition in trenches | Jinrui GUO, Ludovic Godet, Rutger Meyer Timmerman Thijssen, Jhenghan YANG, Chien-An Chen | 2023-02-07 |
| 11543793 | Developer critical dimension control with pulse development | Richard C. Johnson, Hao Tang | 2023-01-03 |
| 11501969 | Direct extreme ultraviolet lithography on hard mask with reverse tone | Yann Mignot, Ekmini Anuja De Silva, Ashim Dutta, Chi-Chun Liu | 2022-11-15 |
| 11398409 | Method of forming a BEOL interconnect structure using a subtractive metal via first process | Yann Mignot, Hsueh-Chung Chen | 2022-07-26 |