Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12087601 | Reducing line edge roughness and mitigating defects by wafer freezing | Jennifer Fullam, Yongan Xu | 2024-09-10 |
| 11688636 | Spin on scaffold film for forming topvia | Somnath Ghosh, Cody J. Murray, Ekmini Anuja De Silva, Chi-Chun Liu, Dominik Metzler +1 more | 2023-06-27 |
| 11067896 | Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay | Cody J. Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Nelson Felix | 2021-07-20 |
| 11022890 | Photoresist bridging defect removal by reverse tone weak developer | Zhenxing Bi, Nicole Saulnier, Hao Tang | 2021-06-01 |
| 11022891 | Photoresist bridging defect removal by reverse tone weak developer | Zhenxing Bi, Nicole Saulnier, Hao Tang | 2021-06-01 |
| 10545409 | Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay | Cody J. Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Nelson Felix | 2020-01-28 |
| 10514605 | Resist multilayer film-attached substrate and patterning process | Seiichiro Tachibana, Tsutomu Ogihara, Hiroko Nagai, Romain Lallement | 2019-12-24 |
| 10254652 | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning | Ekmini Anuja De Silva, Indira Seshadri | 2019-04-09 |
| 10082736 | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning | Ekmini Anuja De Silva, Indira Seshadri | 2018-09-25 |
| 9580623 | Patterning process using a boron phosphorus silicon glass film | Seiichiro Tachibana, Yoshinori Taneda, Rie Kikuchi, Tsutomu Ogihara, Yoshio Kawai +1 more | 2017-02-28 |
| 8946866 | Microelectronic substrate having removable edge extension element | Charles W. Koburger, III, Steven J. Holmes, David V. Horak, Kurt R. Kimmel, Christopher F. Robinson | 2015-02-03 |
| 8202460 | Microelectronic substrate having removable edge extension element | Charles W. Koburger, III, Steven J. Holmes, David V. Horak, Kurt R. Kimmel, Christopher F. Robinson | 2012-06-19 |
| 7960095 | Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates | Wayne M. Moreau, Marie Angelopoulos, Wu-Song Huang, David R. Medeiros | 2011-06-14 |
| 7807335 | Immersion lithography contamination gettering layer | Daniel A. Corliss, Dario Gil, Dario L. Goldfarb, Steven J. Holmes, David V. Horak +2 more | 2010-10-05 |
| 7736833 | Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof | Marie Angelopoulos, Katherina Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros +2 more | 2010-06-15 |
| 7709177 | Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof | Marie Angelopoulos, Katherina Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros +2 more | 2010-05-04 |
| 7638266 | Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer | Marie Angelopoulos, Gregory Breyta, Wu-Song Huang, Robert N. Lang, Wenjie Li +2 more | 2009-12-29 |
| 7361444 | Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof | Marie Angelopoulos, Katherina Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros +2 more | 2008-04-22 |
| 7314700 | High sensitivity resist compositions for electron-based lithography | Wu-Song Huang, Wenjie Li, Wayne M. Moreau, David R. Medeiros, Robert N. Lang +1 more | 2008-01-01 |
| 7168224 | Method of making a packaged radiation sensitive resist film-coated workpiece | Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros, Wayne M. Moreau +2 more | 2007-01-30 |
| 6617086 | Forming a pattern of a negative photoresist | Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Katherina Babich, James J. Bucchignano +1 more | 2003-09-09 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang +3 more | 2003-07-01 |
| 6543617 | Packaged radiation sensitive coated workpiece process for making and method of storing same | Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros, Wayne M. Moreau +2 more | 2003-04-08 |
| 6436605 | Plasma resistant composition and use thereof | Marie Angelopoulos, Ari Aviram, Edward D. Babich, Timothy A. Brunner, Thomas B. Faure +2 more | 2002-08-20 |
| 6251569 | Forming a pattern of a negative photoresist | Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Katherina Babich, James J. Bucchignano +1 more | 2001-06-26 |