Issued Patents All Time
Showing 1–25 of 191 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12379663 | Material for forming organic film, patterning process, and polymer | Daisuke KORI, Seiichiro Tachibana, Shiori Nonaka | 2025-08-05 |
| 12351742 | Material for forming adhesive film, patterning process, and method for forming adhesive film | Mamoru WATABE, Yuji Harada, Takayoshi NAKAHARA, Yusuke Biyajima | 2025-07-08 |
| 12332567 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | Keisuke NIIDA, Yusuke Kai | 2025-06-17 |
| 12332565 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Tsukasa Watanabe, Yusuke Biyajima, Masahiro Kanayama, Ryo MITSUI | 2025-06-17 |
| 12174541 | Composition for forming silicon-containing resist underlayer film and patterning process | Yusuke Biyajima, Masahiro Kanayama | 2024-12-24 |
| 12105420 | Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer | Keisuke NIIDA, Daisuke KORI, Yasuyuki Yamamoto, Takayoshi NAKAHARA | 2024-10-01 |
| 12085857 | Composition for forming silicon-containing resist underlayer film and patterning process | Yusuke Biyajima, Masahiro Kanayama | 2024-09-10 |
| 12032293 | Composition for forming organic film, patterning process, and polymer | Daisuke KORI, Takayoshi NAKAHARA, Yasuyuki Yamamoto, Hironori Satoh | 2024-07-09 |
| 12013640 | Resist underlayer film material, patterning process, and method for forming resist underlayer film | Takayoshi NAKAHARA, Takeru Watanabe, Daisuke KORI, Yusuke Biyajima | 2024-06-18 |
| 12001138 | Composition for forming silicon-containing resist underlayer film and patterning process | Yusuke Kai, Takeru Watanabe, Yusuke Biyajima | 2024-06-04 |
| 11914295 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Tsukasa Watanabe, Yusuke Biyajima, Masahiro Kanayama, Ryo MITSUI | 2024-02-27 |
| 11692066 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Daisuke KORI, Keisuke NIIDA, Takashi SAWAMURA, Takeru Watanabe, Seiichiro Tachibana | 2023-07-04 |
| 11676814 | Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Daisuke KORI, Takashi SAWAMURA, Keisuke NIIDA, Seiichiro Tachibana, Takeru Watanabe | 2023-06-13 |
| 11635691 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer | Daisuke KORI, Takashi SAWAMURA, Keisuke NIIDA, Seiichiro Tachibana, Takeru Watanabe | 2023-04-25 |
| 11615978 | Method for controlling flatness, method for forming coating film, apparatus for controlling flatness, and apparatus for forming coating film | — | 2023-03-28 |
| 11614686 | Resist composition and patterning process | Hironori Satoh, Tsukasa Watanabe, Seiichiro Tachibana, Satoshi Watanabe | 2023-03-28 |
| 11592287 | Method for measuring distance of diffusion of curing catalyst | Tsukasa Watanabe, Yoshio Kawai, Tomohiro Kobayashi, Yusuke Biyajima, Masahiro Kanayama | 2023-02-28 |
| 11518774 | Method for producing iodine-containing silicon compound | Tsukasa Watanabe | 2022-12-06 |
| 11500292 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Daisuke KORI, Keisuke NIIDA, Takashi SAWAMURA, Seiichiro Tachibana, Takeru Watanabe | 2022-11-15 |
| 11485824 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | Toshiharu Yano, Ryo MITSUI, Kazunori Maeda, Seiichiro Tachibana | 2022-11-01 |
| 11480879 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsukasa Watanabe, Yusuke Biyajima, Masahiro Kanayama | 2022-10-25 |
| 11385544 | Composition for forming silicon-containing resist underlayer film and patterning process | Yusuke Biyajima, Masahiro Kanayama, Tsukasa Watanabe, Masaki Ohashi | 2022-07-12 |
| 11366386 | Patterning process | Tsukasa Watanabe | 2022-06-21 |
| 11307497 | Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Seiichiro Tachibana, Takeru Watanabe, Keisuke NIIDA, Hiroko Nagai, Takashi SAWAMURA | 2022-04-19 |
| 11267937 | Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate | Daisuke KORI, Seiichiro Tachibana, Satoru Kitano, Yukio Abe, Fumihiro Hatakeyama +1 more | 2022-03-08 |