Issued Patents All Time
Showing 51–75 of 191 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10007183 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Takeru Watanabe, Kazumi Noda, Toshiharu Yano | 2018-06-26 |
| 9984891 | Method for forming organic film and method for manufacturing substrate for semiconductor apparatus | Rie Kikuchi | 2018-05-29 |
| 9977330 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Takeru Watanabe, Kazumi Noda, Toshiharu Yano | 2018-05-22 |
| 9971245 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | Takeru Watanabe, Kazunori Maeda | 2018-05-15 |
| 9902875 | Composition for forming a coating type BPSG film, substrate, and patterning process | Seiichiro Tachibana, Yoshinori Taneda, Rie Kikuchi | 2018-02-27 |
| 9880470 | Composition for forming a coating type silicon-containing film, substrate, and patterning process | Seiichiro Tachibana, Yoshinori Taneda, Rie Kikuchi | 2018-01-30 |
| 9857686 | Composition for forming resist underlayer film and patterning process | Daisuke KORI, Jun Hatakeyama, Naoki Kobayashi | 2018-01-02 |
| 9805943 | Polymer for resist under layer film composition, resist under layer film composition, and patterning process | Rie Kikuchi, Takeru Watanabe, Seiichiro Tachibana | 2017-10-31 |
| 9804492 | Method for forming multi-layer film and patterning process | Jun Hatakeyama | 2017-10-31 |
| 9798242 | Rinse solution for pattern formation and pattern forming process | Jun Hatakeyama, Daisuke KORI | 2017-10-24 |
| 9728420 | Organic film composition, process for forming organic film, patterning process, and compound | Daisuke KORI, Kazumi Noda, Kazunori Maeda, Rie Kikuchi | 2017-08-08 |
| 9632416 | Rinse solution for pattern formation and pattern forming process | Jun Hatakeyama, Daisuke KORI | 2017-04-25 |
| 9624356 | Ultraviolet absorber, composition for forming a resist under layer film, and patterning process | Daisuke KORI | 2017-04-18 |
| 9627204 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | Takafumi Ueda, Yoshinori Taneda, Seiichiro Tachibana | 2017-04-18 |
| 9620363 | Underlayer film-forming composition and pattern forming process | Jun Hatakeyama, Daisuke KORI | 2017-04-11 |
| 9580623 | Patterning process using a boron phosphorus silicon glass film | Seiichiro Tachibana, Yoshinori Taneda, Rie Kikuchi, Yoshio Kawai, Karen E. Petrillo +1 more | 2017-02-28 |
| 9524863 | Method for cleaning and drying semiconductor substrate | Takeshi Nagata, Jun Hatakeyama, Daisuke KORI | 2016-12-20 |
| 9522979 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | Takeru Watanabe, Yoshinori Taneda, Seiichiro Tachibana | 2016-12-20 |
| 9502247 | Method for forming coating film for lithography | Taku Morisawa | 2016-11-22 |
| 9490144 | Quaternary ammonium salt compound, composition for forming a resist under layer film, and patterning process | Takeru Watanabe | 2016-11-08 |
| 9460934 | Wet strip process for an antireflective coating layer | Martin Glodde, Wu-Song Huang, Javier Perez, Takeshi Kinsho, Seiichiro Tachibana +1 more | 2016-10-04 |
| 9377690 | Compositon for forming metal oxide-containing film and patterning process | Takafumi Ueda, Seiichiro Tachibana, Yoshinori Taneda | 2016-06-28 |
| 9315670 | Composition for forming resist underlayer film and patterning process | Jun Hatakeyama | 2016-04-19 |
| 9312144 | Composition for forming a silicon-containing resist under layer film and patterning process | Yusuke Biyajima | 2016-04-12 |
| 9312127 | Method for producing semiconductor apparatus substrate | Daisuke KORI, Yoshinori Taneda, Yusuke Biyajima, Rie Kikuchi, Seiichiro Tachibana | 2016-04-12 |