Issued Patents All Time
Showing 1–25 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12379663 | Material for forming organic film, patterning process, and polymer | Daisuke KORI, Shiori Nonaka, Tsutomu Ogihara | 2025-08-05 |
| 12379662 | Material for forming organic film, patterning process, compound, and polymer | Daisuke KORI, Shiori Nonaka | 2025-08-05 |
| 12032287 | Resist material and patterning process | Tomohiro Kobayashi, Tsukasa Watanabe, Hiroki Nonaka | 2024-07-09 |
| 11994798 | Resist material and patterning process | Tomohiro Kobayashi, Tsukasa Watanabe, Hiroki Nonaka | 2024-05-28 |
| 11886118 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Daisuke KORI, Takashi SAWAMURA, Keisuke NIIDA | 2024-01-30 |
| 11851530 | Material for forming organic film, patterning process, and polymer | Daisuke KORI, Takashi SAWAMURA, Keisuke NIIDA | 2023-12-26 |
| 11692066 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Daisuke KORI, Keisuke NIIDA, Takashi SAWAMURA, Takeru Watanabe, Tsutomu Ogihara | 2023-07-04 |
| 11676814 | Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Daisuke KORI, Takashi SAWAMURA, Keisuke NIIDA, Takeru Watanabe, Tsutomu Ogihara | 2023-06-13 |
| 11635691 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer | Daisuke KORI, Takashi SAWAMURA, Keisuke NIIDA, Takeru Watanabe, Tsutomu Ogihara | 2023-04-25 |
| 11614686 | Resist composition and patterning process | Hironori Satoh, Tsukasa Watanabe, Satoshi Watanabe, Tsutomu Ogihara | 2023-03-28 |
| 11500292 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Daisuke KORI, Keisuke NIIDA, Takashi SAWAMURA, Takeru Watanabe, Tsutomu Ogihara | 2022-11-15 |
| 11485824 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | Toshiharu Yano, Ryo MITSUI, Kazunori Maeda, Tsutomu Ogihara | 2022-11-01 |
| 11307497 | Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Takeru Watanabe, Keisuke NIIDA, Hiroko Nagai, Takashi SAWAMURA, Tsutomu Ogihara | 2022-04-19 |
| 11267937 | Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate | Daisuke KORI, Tsutomu Ogihara, Satoru Kitano, Yukio Abe, Fumihiro Hatakeyama +1 more | 2022-03-08 |
| 11042090 | Composition for forming organic film | Hiroko Nagai, Daisuke KORI, Tsutomu Ogihara | 2021-06-22 |
| 11022882 | Compound and composition for forming organic film | Takeru Watanabe, Keisuke NIIDA, Hiroko Nagai, Takashi SAWAMURA, Tsutomu Ogihara +4 more | 2021-06-01 |
| 11018015 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process | Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Naoki Kobayashi, Kazumi Noda | 2021-05-25 |
| 10604618 | Compound, method for manufacturing the compound, and composition for forming organic film | Takeru Watanabe, Keisuke NIIDA, Hiroko Nagai, Takashi SAWAMURA, Tsutomu Ogihara +4 more | 2020-03-31 |
| 10514605 | Resist multilayer film-attached substrate and patterning process | Tsutomu Ogihara, Hiroko Nagai, Romain Lallement, Karen E. Petrillo | 2019-12-24 |
| 10131603 | Method for reducing metal of sugar-alcohol compound and sugar-alcohol compound | Takayoshi NAKAHARA, Takeru Watanabe, Tsutomu Ogihara | 2018-11-20 |
| 10007183 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda, Toshiharu Yano | 2018-06-26 |
| 9977330 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda, Toshiharu Yano | 2018-05-22 |
| 9902875 | Composition for forming a coating type BPSG film, substrate, and patterning process | Yoshinori Taneda, Rie Kikuchi, Tsutomu Ogihara | 2018-02-27 |
| 9880470 | Composition for forming a coating type silicon-containing film, substrate, and patterning process | Yoshinori Taneda, Rie Kikuchi, Tsutomu Ogihara | 2018-01-30 |
| 9805943 | Polymer for resist under layer film composition, resist under layer film composition, and patterning process | Rie Kikuchi, Takeru Watanabe, Tsutomu Ogihara | 2017-10-31 |