Issued Patents All Time
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11934100 | Composition for forming silicon-containing resist underlayer film and patterning process | Daisuke KORI, Yusuke Kai | 2024-03-19 |
| 11485824 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | Toshiharu Yano, Ryo MITSUI, Tsutomu Ogihara, Seiichiro Tachibana | 2022-11-01 |
| 10444628 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Yoshinori Taneda | 2019-10-15 |
| 9971245 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | Tsutomu Ogihara, Takeru Watanabe | 2018-05-15 |
| 9728420 | Organic film composition, process for forming organic film, patterning process, and compound | Daisuke KORI, Kazumi Noda, Rie Kikuchi, Tsutomu Ogihara | 2017-08-08 |
| 8933251 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada +2 more | 2015-01-13 |
| 8431323 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada +2 more | 2013-04-30 |
| 8268528 | Resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Koji Hasegawa, Tomohiro Kobayashi | 2012-09-18 |
| 8252504 | Polymer, resist composition, and patterning process | Yuji Harada, Jun Hatakeyama, Tomohiro Kobayashi | 2012-08-28 |
| 8101335 | Resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Koji Hasegawa, Satoshi Shinachi | 2012-01-24 |
| 8057981 | Resist composition, resist protective coating composition, and patterning process | Yuji Harada, Jun Hatakeyama, Tomohiro Kobayashi | 2011-11-15 |
| 7701265 | Power-on reset circuit using flip-flop and semiconductor device having such power-on reset circuit | — | 2010-04-20 |
| 7534554 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | Seiji Nagahara, Satoshi Watanabe | 2009-05-19 |
| 7498126 | Photoacid generators, chemically amplified resist compositions, and patterning process | Youichi Ohsawa, Satoshi Watanabe | 2009-03-03 |
| 7430885 | Drum type washing machine with angled door opening | Satoshi Maeda, Hiroshi Kajihara, Tadashi Inuzuka | 2008-10-07 |
| 7396633 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | Seiji Nagahara, Satoshi Watanabe | 2008-07-08 |
| 7368693 | Microwave oven | — | 2008-05-06 |
| 7335458 | Chemically amplified positive resist composition and patterning process | Youichi Ohsawa, Satoshi Watanabe | 2008-02-26 |
| 7109311 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Katsuhiro Kobayashi, Yoshitaka Yanagi | 2006-09-19 |
| 7101651 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Katsuhiro Kobayashi, Yoshitaka Yanagi | 2006-09-05 |
| 7064991 | Semiconductor storage device | — | 2006-06-20 |
| 7056640 | Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Satoshi Watanabe | 2006-06-06 |
| 6949323 | Resist composition and patterning process | Takanobu Takeda, Osamu Watanabe, Hiroshi Miyakoshi | 2005-09-27 |
| 6916591 | Photoacid generators, chemically amplified resist compositions, and patterning process | Youichi Ohsawa, Katsuhiro Kobayashi, Katsuya Takemura, Junji Tsuchiya | 2005-07-12 |
| 6713612 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Koji Hasegawa, Takao Yoshihara, Toshihiko Fujii | 2004-03-30 |