TF

Toshihiko Fujii

SC Shin-Etsu Chemical Co.: 23 patents #194 of 2,176Top 9%
Nissan Motor Co.: 5 patents #1,472 of 8,689Top 20%
FL Fujitsu Ten Limited: 3 patents #174 of 996Top 20%
Fujitsu Limited: 3 patents #8,614 of 24,456Top 40%
YC Yokowo Co.: 2 patents #59 of 176Top 35%
SO Sony: 1 patents #17,262 of 25,231Top 70%
DL Denso Ten Limited: 1 patents #150 of 359Top 45%
Hoffmann-La Roche: 1 patents #1,850 of 3,238Top 60%
BA Basilea Pharmaceutica Ag: 1 patents #57 of 98Top 60%
Overall (All Time): #77,841 of 4,157,543Top 2%
40
Patents All Time

Issued Patents All Time

Showing 1–25 of 40 patents

Patent #TitleCo-InventorsDate
12261353 Device for vehicle Shota Kondo 2025-03-25
11417947 Antenna device for vehicle Kentaro Hayashi 2022-08-16
10645823 Electronic device Nobutaka Watanabe, Yasuaki Takeda 2020-05-05
9821935 Fixing structure Yasuaki Takeda 2017-11-21
9372404 Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer Takeru Watanabe, Seiichiro Tachibana, Kazumi Noda, Toshiharu Yano, Takeshi Kinsho 2016-06-21
9230827 Method for forming a resist under layer film and patterning process Shiori Nonaka, Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara 2016-01-05
9076738 Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative Takeru Watanabe, Takeshi Kinsho, Tsutomu Ogihara 2015-07-07
8877422 Resist underlayer film composition and patterning process using the same Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Takeru Watanabe, Takeshi Kinsho 2014-11-04
8853031 Resist underlayer film composition and patterning process using the same Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Takeru Watanabe, Takeshi Kinsho 2014-10-07
8835092 Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative Takeru Watanabe, Takeshi Kinsho, Tsutomu Ogihara, Katsuya Takemura, Daisuke KORI 2014-09-16
8663898 Resist underlayer film composition and patterning process using the same Tsutomu Ogihara, Takeru Watanabe, Yusuke Biyajima, Daisuke KORI, Takeshi Kinsho 2014-03-04
8652757 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film Jun Hatakeyama, Tsutomu Ogihara 2014-02-18
8603732 Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process Tsutomu Ogihara, Takeru Watanabe, Takeshi Kinsho, Katsuya Takemura, Daisuke KORI 2013-12-10
8592956 Resist underlayer film composition and patterning process using the same Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Takeru Watanabe, Takeshi Kinsho 2013-11-26
8450048 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film Jun Hatakeyama, Tsutomu Ogihara 2013-05-28
8338078 Photoresist undercoat-forming material and patterning process Jun Hatakeyama, Takeru Watanabe, Youichi Ohsawa 2012-12-25
7871761 Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern Jun Hatakeyama, Youichi Ohsawa 2011-01-18
7745104 Bottom resist layer composition and patterning process using the same Jun Hatakeyama, Takanobu Takeda 2010-06-29
7632624 Photoresist undercoat-forming material and patterning process Jun Hatakeyama, Takeru Watanabe, Katshiro Kobayashi 2009-12-15
7550247 Resist composition and patterning process Mutsuo Nakashima, Yoshitaka Hamada, Katsuya Takemura, Kazumi Noda 2009-06-23
7510820 Resist undercoat-forming material and patterning process Jun Hatakeyama 2009-03-31
7308999 Die bonding apparatus Takashi Ohta, Shinichi Sugiura, Toshimasa Akamatsu, Katsufumi Morimune 2007-12-18
7156681 Plug attaching mechanism Atsushi Kaneda, Ryota Matsumoto 2007-01-02
6899991 Photo-curable resin composition, patterning process, and substrate protecting film Hideto Kato, Kazumi Noda, Kazuhiro Arai, Satoshi Asai 2005-05-31
6867325 Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate-protecting coat Hideto Kato, Satoshi Asai 2005-03-15