Issued Patents All Time
Showing 1–25 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12195568 | Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Masashi Iio, Hiroyuki Urano, Osamu Watanabe | 2025-01-14 |
| 12197127 | Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Masashi Iio, Hiroyuki Urano, Osamu Watanabe | 2025-01-14 |
| 12085856 | Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Masashi Iio, Hiroyuki Urano, Osamu Watanabe | 2024-09-10 |
| 11892773 | Photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Hiroyuki Urano, Masashi Iio | 2024-02-06 |
| 11768434 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | Masashi Iio, Hiroyuki Urano, Kazuya Honda | 2023-09-26 |
| 11572442 | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | Dmitry Zubarev, Hiroyuki Urano, Masashi Iio, Kazuya Honda, Yoshio Kawai | 2023-02-07 |
| 11333975 | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component | Dmitry Zubarev, Hiroyuki Urano, Masashi Iio, Kazuya Honda, Yoshio Kawai | 2022-05-17 |
| 11150556 | Polymer of polyimide precursor, positive type photosensitive resin composition, negative type photosensitive resin composition, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | Hiroyuki Urano, Masashi Iio | 2021-10-19 |
| 10919918 | Tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | Hiroyuki Urano, Hiroki Takano, Masashi Iio, Kazuya Honda | 2021-02-16 |
| 10816900 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Masashi Iio, Koji Hasegawa, Kenji Funatsu | 2020-10-27 |
| 10815572 | Chemically amplified positive resist composition and pattern forming process | Yoshinori Hirano, Satoshi Asai | 2020-10-27 |
| 10457779 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Masashi Iio, Masayoshi Sagehashi, Koji Hasegawa | 2019-10-29 |
| 10319653 | Semiconductor apparatus, stacked semiconductor apparatus, encapsulated stacked-semiconductor apparatus, and method for manufacturing the same | Kyoko Soga, Satoshi Asai, Kazunori Kondo, Michihiro Sugo, Hideto Kato | 2019-06-11 |
| 10216085 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Masashi Iio, Masayoshi Sagehashi, Koji Hasegawa | 2019-02-26 |
| 10203601 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Masashi Iio, Koji Hasegawa, Kenji Funatsu | 2019-02-12 |
| 10197914 | Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate | Masashi Iio, Hiroyuki Urano, Takashi Miyazaki | 2019-02-05 |
| 10141272 | Semiconductor apparatus, stacked semiconductor apparatus and encapsulated stacked-semiconductor apparatus each having photo-curable resin layer | Kyoko Soga, Satoshi Asai, Kazunori Kondo, Michihiro Sugo, Hideto Kato | 2018-11-27 |
| 10114287 | Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate | Hiroyuki Urano, Masashi Iio, Koji Hasegawa, Masahiro Fukushima, Takayuki Fujiwara | 2018-10-30 |
| 10087288 | Silicone skeleton-containing polymer compound, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, substrate, and semiconductor apparatus | Hiroyuki Urano, Masashi Iio, Takashi Miyazaki | 2018-10-02 |
| 9620429 | Semiconductor apparatus, stacked semiconductor apparatus, encapsulated stacked-semiconductor apparatus, and method for manufacturing the same | Kyoko Soga, Satoshi Asai | 2017-04-11 |
| 9557645 | Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate | Masashi Iio, Hiroyuki Urano, Takashi Miyazaki | 2017-01-31 |
| 9519217 | Chemically amplified positive resist composition and patterning process | Yoshinori Hirano | 2016-12-13 |
| 9494863 | Chemically amplified negative resist composition, photo-curable dry film, making method, patterning process, and electric/electronic part-protecting film | Satoshi Asai, Kyoko Soga | 2016-11-15 |
| 9400428 | Polymer compound, chemically amplified negative resist composition, photo-curable dry film and production method thereof, layered product, patterning process, and substrate | Hiroyuki Urano, Masashi Iio, Takashi Miyazaki | 2016-07-26 |
| 9377689 | Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film | Hiroyuki Urano, Masashi Iio, Takayuki Fujiwara, Koji Hasegawa | 2016-06-28 |