Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429772 | Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound | Keiichi Masunaga, Masaaki Kotake, Naoya Inoue | 2025-09-30 |
| 12271112 | Negative resist composition and pattern forming process | Jun Hatakeyama, Naoya Inoue | 2025-04-08 |
| 10816900 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Koji Hasegawa | 2020-10-27 |
| 10457761 | Polymer, resist composition, and pattern forming process | Jun Hatakeyama, Teppei Adachi | 2019-10-29 |
| 10203601 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Koji Hasegawa | 2019-02-12 |
| 10191373 | Method for producing polymer | Jun Hatakeyama, Teppei Adachi | 2019-01-29 |
| 9778568 | Positive resist composition and patterning process | Akihiko Seki | 2017-10-03 |
| 9618850 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama, Koji Hasegawa | 2017-04-11 |
| 9551932 | Patterning process and resist composition | Kentaro Kumaki, Akihiro Seki, Tomohiro Kobayashi, Koji Hasegawa | 2017-01-24 |
| 9250523 | Resist composition and patterning process | Jun Hatakeyama, Kazuhiro Katayama | 2016-02-02 |
| 9122152 | Patterning process and resist composition | Jun Hatakeyama, Tomohiro Kobayashi | 2015-09-01 |
| 9091933 | Negative pattern forming process | Tomohiro Kobayashi, Kazuhiro Katayama, Jun Hatakeyama, Seiichiro Tachibana | 2015-07-28 |
| 9086625 | Resist composition and patterning process | Jun Hatakeyama, Kazuhiro Katayama | 2015-07-21 |
| 9040223 | Resist composition, patterning process and polymer | Jun Hatakeyama, Koji Hasegawa | 2015-05-26 |
| 8871427 | Positive resist composition and patterning process | Ryosuke Taniguchi, Akihiro Seki, Katsuhiro Kobayashi | 2014-10-28 |
| 8623590 | Pattern forming process | Jun Hatakeyama | 2014-01-07 |
| 7718342 | Polymers, resist compositions and patterning process | Tomohiro Kobayashi, Koji Hasegawa, Tsunehiro Nishi | 2010-05-18 |
| 7157207 | Polymer, resist material and patterning processing | Tsunehiro Nishi, Shigehiro Nagura | 2007-01-02 |
| 7135270 | Resist polymer, resist composition and patterning process | Takeru Watanabe, Tsunehiro Nishi, Junji Tsuchiya, Koji Hasegawa | 2006-11-14 |
| 6835525 | Polymer, resist composition and patterning process | Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana | 2004-12-28 |
| 6239303 | Silylation of hydroxyl group-containing compound | Tohru Kubota, Mikio Endo | 2001-05-29 |