Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429772 | Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound | Keiichi Masunaga, Kenji Funatsu, Naoya Inoue | 2025-09-30 |
| 12164227 | Chemically amplified negative resist composition and resist pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi | 2024-12-10 |
| 12164231 | Chemically amplified positive resist composition and resist pattern forming process | Satoshi Watanabe, Keiichi Masunaga, Masaki Ohashi | 2024-12-10 |
| 11852974 | Conductive polymer composition, coated product and patterning process | Takayuki Nagasawa, Keiichi Masunaga, Satoshi Watanabe | 2023-12-26 |
| 11548844 | Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process | Daisuke Domon, Masayoshi Sagehashi, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe | 2023-01-10 |
| 11429023 | Onium salt, negative resist composition, and resist pattern forming process | Daisuke Domon, Naoya Inoue, Masaki Ohashi, Keiichi Masunaga | 2022-08-30 |
| 11231650 | Chemically amplified negative resist composition and resist pattern forming process | Satoshi Watanabe, Keiichi Masunaga | 2022-01-25 |
| 11131926 | Resist composition and resist patterning process | Takahiro Suzuki, Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe | 2021-09-28 |
| 11124477 | Sulfonium compound, positive resist composition, and resist pattern forming process | Naoya Inoue, Masaki Ohashi, Daisuke Domon, Keiichi Masunaga | 2021-09-21 |
| 10725377 | Chemically amplified negative resist composition and resist pattern forming process | Satoshi Watanabe, Keiichi Masunaga, Kenji Yamada, Masaki Ohashi | 2020-07-28 |
| 10495969 | Chemically amplified positive resist composition and resist pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi | 2019-12-03 |
| 10416558 | Positive resist composition, resist pattern forming process, and photomask blank | Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi | 2019-09-17 |
| 10120279 | Negative resist composition and resist pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Kenji Yamada, Masaki Ohashi | 2018-11-06 |
| 9969829 | Polymer compound, negative resist composition, laminate, patterning process, and compound | Daisuke Domon, Koji Hasegawa, Keiichi Masunaga | 2018-05-15 |
| 9944738 | Polymer compound, positive resist composition, laminate, and resist patterning process | Daisuke Domon, Satoshi Watanabe, Keiichi Masunaga | 2018-04-17 |
| 9740098 | Chemically amplified negative resist composition using novel onium salt and resist pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Daisuke Domon, Takayuki Fujiwara | 2017-08-22 |
| 9720323 | Chemically amplified positive resist composition and pattern forming process | Takayuki Fujiwara, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe | 2017-08-01 |