MO

Masaki Ohashi

SC Shin-Etsu Chemical Co.: 153 patents #7 of 2,176Top 1%
TC Toyoda Gosei Co.: 4 patents #572 of 2,296Top 25%
IBM: 2 patents #32,839 of 70,183Top 50%
JA Japan Atomic Energy Agency: 2 patents #29 of 251Top 15%
SS Ssd: 2 patents #6 of 33Top 20%
NT Ntn: 1 patents #814 of 1,364Top 60%
ED Eudyna Devices: 1 patents #37 of 80Top 50%
SC Sumitomo Chemical: 1 patents #2,469 of 4,033Top 65%
Tdk: 1 patents #2,493 of 3,796Top 70%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
SC Seed Co.: 1 patents #13 of 67Top 20%
Overall (All Time): #5,196 of 4,157,543Top 1%
163
Patents All Time

Issued Patents All Time

Showing 1–25 of 163 patents

Patent #TitleCo-InventorsDate
12275693 Onium salt, chemically amplified resist composition and patterning process Masayoshi Sagehashi, Takayuki Fujiwara, Masahiro Fukushima, Kazuhiro Katayama 2025-04-15
12174536 Resist composition and pattern forming process Ryosuke Taniguchi 2024-12-24
12164227 Chemically amplified negative resist composition and resist pattern forming process Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake 2024-12-10
12164231 Chemically amplified positive resist composition and resist pattern forming process Masaaki Kotake, Satoshi Watanabe, Keiichi Masunaga 2024-12-10
12072627 Resist composition and patterning process Teppei Adachi, Shinya Yamashita, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara 2024-08-27
12050402 Resist composition and patterning process Teppei Adachi, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara 2024-07-30
11953827 Molecular resist composition and patterning process Masahiro Fukushima, Kazuhiro Katayama 2024-04-09
11940728 Molecular resist composition and patterning process Kazuhiro Katayama, Masahiro Fukushima, Shun Kikuchi 2024-03-26
11822239 Resist composition and patterning process Jun Hatakeyama, Takayuki Fujiwara 2023-11-21
11774853 Resist composition and patterning process Jun Hatakeyama, Masahiro Fukushima, Takayuki Fujiwara, Kazuhiro Katayama 2023-10-03
11709872 Computer-readable recording medium storing response processing program, response processing method, and information processing apparatus Shinichi Kawakami 2023-07-25
11693314 Resist composition and patterning process Teppei Adachi, Shinya Yamashita, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara 2023-07-04
11687000 Sulfonium compound, chemically amplified resist composition, and patterning process Masahiro Fukushima, Kazuhiro Katayama, Yuki Kera 2023-06-27
11635690 Positive resist composition and patterning process Jun Hatakeyama, Takayuki Fujiwara 2023-04-25
11604411 Resist composition and patterning process Jun Hatakeyama, Takayuki Fujiwara 2023-03-14
11579526 Resist composition and patterning process Ryosuke Taniguchi, Satoshi Watanabe, Naoya Inoue 2023-02-14
11560355 Onium salt, chemically amplified resist composition, and patterning process Masahiro Fukushima, Kazuhiro Katayama 2023-01-24
11506977 Positive resist composition and patterning process Jun Hatakeyama, Takayuki Fujiwara 2022-11-22
11460773 Resist composition and patterning process Jun Hatakeyama, Takayuki Fujiwara 2022-10-04
11460772 Positive resist composition and patterning process Jun Hatakeyama 2022-10-04
11448961 Iodonium salt, resist composition, and pattern forming process Takayuki Fujiwara, Kazuhiro Katayama, Kenji Yamada 2022-09-20
11448962 Resist composition and patterning process Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi 2022-09-20
11435665 Resist composition and patterning process Jun Hatakeyama, Takayuki Fujiwara 2022-09-06
11429023 Onium salt, negative resist composition, and resist pattern forming process Daisuke Domon, Naoya Inoue, Keiichi Masunaga, Masaaki Kotake 2022-08-30
11415887 Resist composition and patterning process Jun Hatakeyama, Takayuki Fujiwara 2022-08-16