Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12410363 | Diverting agent and method of filling fracture in well using same | Yasuhiro Hirano, Chizuko Furo | 2025-09-09 |
| 12174536 | Resist composition and pattern forming process | Masaki Ohashi | 2024-12-24 |
| 12110450 | Diverting agent and method of filling fracture in well using same | Yasuhiro Hirano, Takahiro Saka, Chizuko Furo | 2024-10-08 |
| 12060317 | Onium salt, chemically amplified negative resist composition, and pattern forming process | Masahiro Fukushima, Satoshi Watanabe, Naoya Inoue | 2024-08-13 |
| 12054667 | Diverting agent and method of filling fracture in well using same | Yasuhiro Hirano, Takahiro Saka, Chizuko Furo | 2024-08-06 |
| 11891569 | Diverting agent and method of filling fracture in well using the same | Yasuhiro Hirano, Chizuko Furo | 2024-02-06 |
| 11819010 | Sex identification device for fertilized eggs, sex identification method for fertilized eggs, and program | — | 2023-11-21 |
| 11773059 | Onium salt, chemically amplified negative resist composition, and pattern forming process | Naoya Inoue, Satoshi Watanabe, Masahiro Fukushima | 2023-10-03 |
| 11674073 | Diverting agent and method of filling fracture in well using same | Shusaku Mandai, Yasuhiro Hirano, Chizuko Furo, Kenji Furui, Kenji Shinohara +1 more | 2023-06-13 |
| 11614688 | Resist composition and patterning process | Satoshi Watanabe, Takayuki Fujiwara, Naoya Inoue | 2023-03-28 |
| 11579526 | Resist composition and patterning process | Satoshi Watanabe, Masaki Ohashi, Naoya Inoue | 2023-02-14 |
| 11492337 | Epoxy compound, resist composition, and pattern forming process | Masayoshi Sagehashi, Takeru Watanabe, Yoshinori Matsui | 2022-11-08 |
| 11215926 | Sulfonium compound, resist composition, and patterning process | Takayuki Fujiwara, Ryo MITSUI, Masaki Ohashi, Koji Hasegawa | 2022-01-04 |
| 10921710 | Resist composition and pattern forming process | Teppei Adachi, Kazuhiro Katayama | 2021-02-16 |
| 10310376 | Resist composition, pattern forming process, polymer, and monomer | Teppei Adachi, Koji Hasegawa, Kenji Yamada | 2019-06-04 |
| 10248022 | Sulfonium compound, making method, resist composition, and pattern forming process | Masaki Ohashi | 2019-04-02 |
| 10180626 | Sulfonium salt, resist composition, and patterning process | Takayuki Fujiwara, Masaki Ohashi | 2019-01-15 |
| 10173975 | Sulfonium compound, resist composition, and pattern forming process | Masaki Ohashi, Takayuki Fujiwara, Kazuya Honda, Takahiro Suzuki | 2019-01-08 |
| 10025180 | Sulfonium compound, resist composition, and patterning process | Ryo MITSUI, Takayuki Fujiwara, Koji Hasegawa, Masaki Ohashi | 2018-07-17 |
| 9740100 | Hemiacetal compound, polymer, resist composition, and patterning process | Koji Hasegawa, Masayoshi Sagehashi, Masahiro Fukushima | 2017-08-22 |
| 9703193 | Onium salt, resist composition, and patterning process | Takayuki Fujiwara, Masaki Ohashi | 2017-07-11 |
| 9458144 | Monomer, polymer, resist composition, and patterning process | Takayuki Fujiwara, Masayoshi Sagehashi, Koji Hasegawa | 2016-10-04 |
| 9256127 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Takayuki Fujiwara, Koji Hasegawa | 2016-02-09 |
| 9223205 | Acid generator, chemically amplified resist composition, and patterning process | Masaki Ohashi, Takayuki Nagasawa | 2015-12-29 |
| 9221742 | Sulfonium salt, chemically amplified resist composition, and pattern forming process | Masaki Ohashi, Masahiro Fukushima, Tomohiro Kobayashi | 2015-12-29 |