Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12332565 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Tsutomu Ogihara, Tsukasa Watanabe, Yusuke Biyajima, Masahiro Kanayama | 2025-06-17 |
| 11914295 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Tsutomu Ogihara, Tsukasa Watanabe, Yusuke Biyajima, Masahiro Kanayama | 2024-02-27 |
| 11485824 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | Toshiharu Yano, Kazunori Maeda, Tsutomu Ogihara, Seiichiro Tachibana | 2022-11-01 |
| 11215926 | Sulfonium compound, resist composition, and patterning process | Takayuki Fujiwara, Masaki Ohashi, Ryosuke Taniguchi, Koji Hasegawa | 2022-01-04 |
| 10754248 | Sulfonium salt, resist composition, and patterning process | Takayuki Fujiwara, Kazuhiro Katayama | 2020-08-25 |
| 10717804 | Silicon-containing compound, urethane resin, stretchable film, and method for forming the same | Jun Hatakeyama, Shiori Nonaka, Yuji Harada, Osamu Watanabe | 2020-07-21 |
| 10696779 | Silicon-containing compound, urethane resin, stretchable film, and method for forming the same | Jun Hatakeyama, Yuji Harada, Shiori Nonaka, Osamu Watanabe | 2020-06-30 |
| 10025180 | Sulfonium compound, resist composition, and patterning process | Takayuki Fujiwara, Ryosuke Taniguchi, Koji Hasegawa, Masaki Ohashi | 2018-07-17 |