Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12351742 | Material for forming adhesive film, patterning process, and method for forming adhesive film | Mamoru WATABE, Yuji Harada, Takayoshi NAKAHARA, Tsutomu Ogihara | 2025-07-08 |
| 12332565 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Tsutomu Ogihara, Tsukasa Watanabe, Masahiro Kanayama, Ryo MITSUI | 2025-06-17 |
| 12215221 | Material for forming organic film, method for forming organic film, patterning process, and compound | Daisuke KORI, Takayoshi NAKAHARA, Kazumi Noda | 2025-02-04 |
| 12174541 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Masahiro Kanayama | 2024-12-24 |
| 12147160 | Resist underlayer film material, patterning process, and method for forming resist underlayer film | Daisuke KORI, Takayoshi NAKAHARA, Yuji Harada | 2024-11-19 |
| 12085857 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Masahiro Kanayama | 2024-09-10 |
| 12013640 | Resist underlayer film material, patterning process, and method for forming resist underlayer film | Takayoshi NAKAHARA, Takeru Watanabe, Daisuke KORI, Tsutomu Ogihara | 2024-06-18 |
| 12001138 | Composition for forming silicon-containing resist underlayer film and patterning process | Yusuke Kai, Takeru Watanabe, Tsutomu Ogihara | 2024-06-04 |
| 11914295 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Tsutomu Ogihara, Tsukasa Watanabe, Masahiro Kanayama, Ryo MITSUI | 2024-02-27 |
| 11822247 | Material for forming organic film, method for forming organic film, patterning process, and compound | Takayoshi NAKAHARA, Daisuke KORI | 2023-11-21 |
| 11720023 | Material for forming organic film, method for forming organic film, patterning process, and compound | Daisuke KORI, Takayoshi NAKAHARA | 2023-08-08 |
| 11592287 | Method for measuring distance of diffusion of curing catalyst | Tsutomu Ogihara, Tsukasa Watanabe, Yoshio Kawai, Tomohiro Kobayashi, Masahiro Kanayama | 2023-02-28 |
| 11480879 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Tsukasa Watanabe, Masahiro Kanayama | 2022-10-25 |
| 11385544 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Masahiro Kanayama, Tsukasa Watanabe, Masaki Ohashi | 2022-07-12 |
| 11018015 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process | Tsutomu Ogihara, Daisuke KORI, Seiichiro Tachibana, Naoki Kobayashi, Kazumi Noda | 2021-05-25 |
| 10620537 | Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition | Takeru Watanabe, Rie Kikuchi, Daisuke KORI, Tsutomu Ogihara | 2020-04-14 |
| 10610906 | Method for manufacturing a resist composition | Motoaki Iwabuchi, Tsutomu Ogihara, Yukio Hoshi | 2020-04-07 |
| 9312144 | Composition for forming a silicon-containing resist under layer film and patterning process | Tsutomu Ogihara | 2016-04-12 |
| 9312127 | Method for producing semiconductor apparatus substrate | Tsutomu Ogihara, Daisuke KORI, Yoshinori Taneda, Rie Kikuchi, Seiichiro Tachibana | 2016-04-12 |
| 9207535 | Method for producing resist composition | Tsutomu Ogihara, Motoaki Iwabuchi | 2015-12-08 |
| 9201301 | Method for producing resist composition | Tsutomu Ogihara, Motoaki Iwabuchi, Taku Morisawa | 2015-12-01 |
| 9052603 | Pattern forming process | Jun Hatakeyama, Tsutomu Ogihara | 2015-06-09 |
| 8877422 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Daisuke KORI, Toshihiko Fujii, Takeru Watanabe, Takeshi Kinsho | 2014-11-04 |
| 8853031 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Daisuke KORI, Takeru Watanabe, Toshihiko Fujii, Takeshi Kinsho | 2014-10-07 |
| 8663898 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Takeru Watanabe, Daisuke KORI, Takeshi Kinsho, Toshihiko Fujii | 2014-03-04 |