Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10444628 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Kazunori Maeda | 2019-10-15 |
| 10429739 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Rie Kikuchi | 2019-10-01 |
| 9902875 | Composition for forming a coating type BPSG film, substrate, and patterning process | Seiichiro Tachibana, Rie Kikuchi, Tsutomu Ogihara | 2018-02-27 |
| 9880470 | Composition for forming a coating type silicon-containing film, substrate, and patterning process | Seiichiro Tachibana, Rie Kikuchi, Tsutomu Ogihara | 2018-01-30 |
| 9627204 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | Tsutomu Ogihara, Takafumi Ueda, Seiichiro Tachibana | 2017-04-18 |
| 9580623 | Patterning process using a boron phosphorus silicon glass film | Seiichiro Tachibana, Rie Kikuchi, Tsutomu Ogihara, Yoshio Kawai, Karen E. Petrillo +1 more | 2017-02-28 |
| 9522979 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | Takeru Watanabe, Tsutomu Ogihara, Seiichiro Tachibana | 2016-12-20 |
| 9377690 | Compositon for forming metal oxide-containing film and patterning process | Tsutomu Ogihara, Takafumi Ueda, Seiichiro Tachibana | 2016-06-28 |
| 9312127 | Method for producing semiconductor apparatus substrate | Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Rie Kikuchi, Seiichiro Tachibana | 2016-04-12 |
| 9188866 | Composition for forming titanium-containing resist underlayer film and patterning process | Tsutomu Ogihara, Seiichiro Tachibana, Takafumi Ueda | 2015-11-17 |
| 9176382 | Composition for forming titanium-containing resist underlayer film and patterning process | Tsutomu Ogihara, Seiichiro Tachibana, Takafumi Ueda | 2015-11-03 |
| 9075309 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | Tsutomu Ogihara, Takafumi Ueda | 2015-07-07 |
| 9069247 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | Tsutomu Ogihara, Takafumi Ueda | 2015-06-30 |
| 8945820 | Silicon-containing resist underlayer film-forming composition and patterning process | Tsutomu Ogihara, Takafumi Ueda | 2015-02-03 |
| 8932953 | Composition for forming a silicon-containing resist underlayer film and patterning process using the same | Tsutomu Ogihara, Takafumi Ueda, Toshiharu Yano | 2015-01-13 |
| 8759220 | Patterning process | Tsutomu Ogihara, Takafumi Ueda, Seiichiro Tachibana, Martin Glodde, Margaret C. Lawson +1 more | 2014-06-24 |