TY

Toshiharu Yano

SC Shin-Etsu Chemical Co.: 20 patents #231 of 2,176Top 15%
📍 Joetsu, JP: #53 of 239 inventorsTop 25%
Overall (All Time): #219,943 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
11782347 Composition for forming organic film, patterning process, and polymer Daisuke KORI, Kenta ISHIWATA, Yasuyuki Yamamoto 2023-10-10
11485824 Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process Ryo MITSUI, Kazunori Maeda, Tsutomu Ogihara, Seiichiro Tachibana 2022-11-01
10007183 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda 2018-06-26
9977330 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda 2018-05-22
9372404 Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer Takeru Watanabe, Seiichiro Tachibana, Toshihiko Fujii, Kazumi Noda, Takeshi Kinsho 2016-06-21
9261788 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda 2016-02-16
8951917 Composition for forming resist underlayer film and patterning process using the same Tsutomu Ogihara, Takafumi Ueda, Fujio Yagihashi 2015-02-10
8951711 Patterning process and composition for forming silicon-containing film usable therefor Tsutomu Ogihara, Takafumi Ueda 2015-02-10
8932953 Composition for forming a silicon-containing resist underlayer film and patterning process using the same Tsutomu Ogihara, Takafumi Ueda, Yoshinori Taneda 2015-01-13
8859189 Patterning process Tsutomu Ogihara, Takafumi Ueda 2014-10-14
8852844 Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process Tsutomu Ogihara, Takafumi Ueda 2014-10-07
8835102 Patterning process and composition for forming silicon-containing film usable therefor Tsutomu Ogihara, Takafumi Ueda 2014-09-16
8697330 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same Tsutomu Ogihara, Takafumi Ueda 2014-04-15
8652750 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Tsutomu Ogihara, Koji Hasegawa 2014-02-18
8652267 Coated-type silicon-containing film stripping process Tsutomu Ogihara, Takafumi Ueda, Shozo Shirai 2014-02-18
8501386 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process Tsutomu Ogihara, Takafumi Ueda, Koji Hasegawa 2013-08-06
8343711 Patterning process Tsutomu Ogihara, Takafumi Ueda 2013-01-01
8029974 Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process Tsutomu Ogihara, Takafumi Ueda 2011-10-04
8026038 Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method Tsutomu Ogihara, Takafumi Ueda, Mutsuo Nakashima 2011-09-27
7875417 Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Tsutomu Ogihara, Koji Hasegawa 2011-01-25