FY

Fujio Yagihashi

SC Shin-Etsu Chemical Co.: 31 patents #132 of 2,176Top 7%
Sumitomo Electric Industries: 11 patents #2,408 of 21,551Top 15%
PA Panasonic: 3 patents #7,617 of 21,108Top 40%
NT NTT: 3 patents #1,627 of 4,871Top 35%
SC Sankei Pharmaceutical Co.: 1 patents #3 of 3Top 100%
NC Nippon Pharmaceutical Development Institute Co.: 1 patents #3 of 3Top 100%
📍 Mukawa, JP: #1 of 2 inventorsTop 50%
Overall (All Time): #85,557 of 4,157,543Top 3%
38
Patents All Time

Issued Patents All Time

Showing 1–25 of 38 patents

Patent #TitleCo-InventorsDate
12024532 Silanol compound and method for producing silanol compound Masayasu IGARASHI, Kazuhiko Sato, Tomohiro Matsumoto, Takeshi Nozawa, Shigeru Shimada 2024-07-02
8951917 Composition for forming resist underlayer film and patterning process using the same Tsutomu Ogihara, Takafumi Ueda, Toshiharu Yano 2015-02-10
8715913 Silicon-containing resist underlayer film-forming composition and patterning process Tsutomu Ogihara, Takafumi Ueda 2014-05-06
8277600 High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device Yoshitaka Hamada, Takeshi Asano 2012-10-02
8257528 Substrate joining method and 3-D semiconductor device Yoshitaka Hamada, Takeshi Asano 2012-09-04
7786022 Method for forming insulating film with low dielectric constant Yoshitaka Hamada, Takeshi Asano, Hideo Nakagawa, Masaru Sasago 2010-08-31
7754330 Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device Yoshitaka Hamada, Takeshi Asano, Hideo Nakagawa, Masaru Sasago 2010-07-13
7651829 Positive resist material and pattern formation method using the same Yoshitaka Hamada, Mutsuo Nakashima, Kazumi Noda, Katsuya Takemura 2010-01-26
7405459 Semiconductor device comprising porous film Tsutomu Ogihara, Hideo Nakagawa, Masaru Sasago 2008-07-29
7402621 Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device Tsutomu Ogihara, Yoshitaka Hamada, Takeshi Anaso, Motoaki Iwabuchi, Masaru Sasago +1 more 2008-07-22
7357961 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Motoaki Iwabuchi, Yoshitaka Hamada, Takeshi Asano, Hideo Nakagawa, Masaru Sasago 2008-04-15
7341775 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Yoshitaka Hamada, Hideo Nakagawa, Masaru Sasago 2008-03-11
7332446 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device Tsutomu Ogihara, Yoshitaka Hamada, Takeshi Asano, Motoaki Iwabuchi, Hideo Nakagawa +1 more 2008-02-19
7309722 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Tsutomu Ogihara, Hideo Nakagawa, Masaru Sasago 2007-12-18
7303785 Antireflective film material, and antireflective film and pattern formation method using the same Tsutomu Ogihara, Takeshi Asano, Motoaki Iwabuchi 2007-12-04
7244657 Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Tsutomu Ogihara, Hideo Nakagawa, Masaru Sasago 2007-07-17
7239018 Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst Yoshitaka Hamada, Hideo Nakagawa, Masaru Sasago 2007-07-03
7205338 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Tsutomu Ogihara, Hideo Nakagawa, Masaru Sasago 2007-04-17
7202013 Antireflective film material, and antireflective film and pattern formation method using the same Tsutomu Ogihara, Takeshi Asano, Motoaki Iwabuchi 2007-04-10
7132473 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Tsutomu Ogihara, Yoshitaka Hamada, Takeshi Asano, Motoaki Iwabuchi, Hideo Nakagawa +1 more 2006-11-07
7126208 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Motoaki Iwabuchi, Yoshitaka Hamada, Hideo Nakagawa, Masaru Sasago 2006-10-24
7119354 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film Yoshitaka Hamada, Hideo Nakagawa, Masaru Sasago 2006-10-10
7084505 Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device Yoshitaka Hamada, Hideo Nakagawa, Masaru Sasago 2006-08-01
6841334 Onium salts and positive resist materials using the same Tomoyoshi Furihata, Jun Watanabe, Akinobu Tanaka, Yoshio Kawai, Tadahito Matsuda 2005-01-11
6680107 Film forming composition, porous film and their preparation Motoaki Iwabuchi, Akira Yamamoto 2004-01-20