Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9650538 | Method for manufacturing micro-structure | Hideto Kato, Hiroshi Kanbara, Yoshinori Hirano | 2017-05-16 |
| 9520522 | Method of manufacturing solar cell module | Atsuo Ito, Hiroto Ohwada, Hyung Bae Kim, Sumio Sekiyama, Junichi Tsukada +2 more | 2016-12-13 |
| 9385253 | Method of manufacturing solar cell module | Atsuo Ito, Hiroto Ohwada, Hyung Bae Kim, Sumio Sekiyama, Junichi Tsukada +2 more | 2016-07-05 |
| 9299875 | Manufacture of solar cell module | Hiroto Ohwada, Junichi Tsukada, Atsuo Ito, Atsushi Yaginuma, Naoki Yamakawa +1 more | 2016-03-29 |
| 8999743 | Manufacture of solar cell module | Hiroto Ohwada, Naoki Yamakawa, Masahiro Hinata | 2015-04-07 |
| 8785114 | Method for manufacturing micro-structure | Hideto Kato, Hiroshi Kanbara, Yoshinori Hirano | 2014-07-22 |
| 8628858 | Silicone rubber composition for optical sheet, and optical sheet | Minoru Igarashi, Tsutomu Nakamura, Atsuo Ito, Hyung Bae Kim | 2014-01-14 |
| 8048611 | Polyorganosiloxane, resin composition, and patterning process | Hideto Kato, Masahiro Furuya, Yoshinori Hirano | 2011-11-01 |
| 7175960 | Positive resist composition and patterning process | Hideto Kato | 2007-02-13 |
| 6911292 | Positive resist composition and patterning process | Hideto Kato | 2005-06-28 |
| 6841334 | Onium salts and positive resist materials using the same | Fujio Yagihashi, Jun Watanabe, Akinobu Tanaka, Yoshio Kawai, Tadahito Matsuda | 2005-01-11 |
| 6790581 | Hybrid compound, resist, and patterning process | Hideto Kato | 2004-09-14 |
| 6773858 | Positive photoresist composition | Hideto Kato, Kyoko Soga | 2004-08-10 |
| 6590010 | Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating | Hideto Kato, Takafumi Ueda | 2003-07-08 |
| 6582767 | Metal pattern forming method | Motoo Fukushima, Eiichi Tabei, Masaya Arakawa | 2003-06-24 |
| 6558867 | Lift-off resist compositions | Kazumi Noda, Hideto Kato | 2003-05-06 |
| 6437058 | Polymers and positive resist compositions | Hideto Kato, Yoshinori Hirano | 2002-08-20 |
| 6383944 | Micropatterning method | Hideto Kato, Satoshi Okazaki | 2002-05-07 |
| 6335141 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Yoshihumi Takeda, Shigehiro Nagura, Toshinobu Ishihara +1 more | 2002-01-01 |
| 6312869 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Yoshihumi Takeda, Shigehiro Nagura, Toshinobu Ishihara +1 more | 2001-11-06 |
| 6242151 | Polymers, resist compositions and patterning method | Hideto Kato, Satoshi Okazaki | 2001-06-05 |
| 6221989 | Polymers and positive resist compositions | Hideto Kato, Satoshi Okazaki | 2001-04-24 |
| 6218069 | Photosensitive resin composition and making process | Hideto Kato, Satoshi Okazaki | 2001-04-17 |
| 6114462 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Yoshihumi Takeda, Shigehiro Nagura, Toshinobu Ishihara +1 more | 2000-09-05 |
| 5942367 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Yoshihumi Takeda, Shigehiro Nagura, Toshinobu Ishihara +1 more | 1999-08-24 |