Issued Patents All Time
Showing 1–25 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7157207 | Polymer, resist material and patterning processing | Kenji Funatsu, Tsunehiro Nishi | 2007-01-02 |
| 6830866 | Resist composition and patterning process | Tomohiro Kobayashi, Tsunehiro Nishi, Satoshi Watanabe, Takeshi Kinsho, Toshinobu Ishihara | 2004-12-14 |
| 6818148 | Resist composition and patterning method | Satoshi Watanabe, Toyohisa Sakurada, Yoshitaka Yanagi, Toshinobu Ishihara | 2004-11-16 |
| 6730453 | High molecular weight silicone compounds, resist compositions, and patterning method | Mutsuo Nakashima, Ichiro Kaneko, Toshinobu Ishihara, Junji Tsuchiya, Jun Hatakeyama | 2004-05-04 |
| 6703183 | Polymer, resist composition and patterning process | Tsunehiro Nishi, Takeshi Kinsho, Koji Hasegawa, Satoshi Watanabe | 2004-03-09 |
| 6641975 | Resist composition and patterning process | Takanobu Takeda, Osamu Watanabe, Kazuhiro Hirahara, Kazunori Maeda, Wataru Kusaki | 2003-11-04 |
| 6605408 | Resist composition and patterning process | Tsunehiro Nishi, Takeshi Kinsho, Tomohiro Kobayashi, Satoshi Watanabe | 2003-08-12 |
| 6440634 | Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process | Youichi Ohsawa, Jun Watanabe, Wataru Kusaki, Satoshi Watanabe, Takeshi Nagata | 2002-08-27 |
| 6416928 | Onium salts, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Jun Watanabe, Satoshi Watanabe | 2002-07-09 |
| 6395446 | Resist compositions and patterning process | Akihiro Seki, Katsuya Takemura, Youichi Ohsawa, Jun Watanabe | 2002-05-28 |
| 6338931 | Resist compositions and patterning process | Kazunori Maeda, Takeshi Nagata, Satoshi Watanabe, Youichi Ohsawa, Jun Watanabe | 2002-01-15 |
| 6335141 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Toshinobu Ishihara +1 more | 2002-01-01 |
| 6312869 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Toshinobu Ishihara +1 more | 2001-11-06 |
| 6309796 | High molecular weight silicone compounds resist compositions, and patterning method | Mutsuo Nakashima, Ichiro Kaneko, Toshinobu Ishihara, Junji Tsuchiya, Jun Hatakeyama | 2001-10-30 |
| 6274286 | Resist compositions | Jun Hatakeyama, Tsunehiro Nishi, Takeshi Nagata | 2001-08-14 |
| 6194564 | Process for production of saline-solution soluble xanthan gum | Kanji Murofushi | 2001-02-27 |
| 6156477 | Polymers and chemically amplified positive resist compositions | Kiyoshi Motomi, Osamu Watanabe, Satoshi Watanabe, Toshinobu Ishihara | 2000-12-05 |
| 6117621 | Patterning method | Jun Hatakeyama | 2000-09-12 |
| 6114462 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Toshinobu Ishihara +1 more | 2000-09-05 |
| 6110731 | Apparatus for the production of xanthan gum | Kanji Murofushi, Taira Homma | 2000-08-29 |
| 6106993 | Chemically amplified positive resist composition | Satoshi Watanabe, Osamu Watanabe, Toshinobu Ishihara | 2000-08-22 |
| 6048661 | Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation | Tsunehiro Nishi, Jun Hatakeyama, Toshinobu Ishihara | 2000-04-11 |
| 6033828 | Partially hydrogenated polymers and chemically amplified positive resist compositions | Junji Shimada, Osamu Watanabe, Satoshi Watanabe, Toshinobu Ishihara | 2000-03-07 |
| 6030746 | Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositions | Takeshi Nagata, Satoshi Watanabe, Tsunehiro Nishi, Jun Hatakeyama, Toshinobu Ishihara | 2000-02-29 |
| 6027854 | Polymers chemically amplified positive resist compositions, and patterning method | Tsunehiro Nishi, Osamu Watanabe, Satoshi Watanabe, Toshinobu Ishihara | 2000-02-22 |