Issued Patents All Time
Showing 1–25 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9448482 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | Kaoru Iwato, Hiroo Takizawa | 2016-09-20 |
| 9075306 | Chemically amplified negative resist composition and patterning process | Tamotsu Watanabe, Ryuji Koitabashi, Keiichi Masunaga, Akinobu Tanaka, Osamu Watanabe | 2015-07-07 |
| 8889810 | Adhesive composition and adhesive dry film | Kyoko Soga, Satoshi Asai | 2014-11-18 |
| 8729148 | Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts | Satoshi Asai, Hideto Kato | 2014-05-20 |
| 8697333 | Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film | Kyoko Soga, Hideto Kato | 2014-04-15 |
| 8481244 | Epoxy-containing polymer, photo-curable resin composition, patterning process, and electric/electronic part protective film | Hideto Kato | 2013-07-09 |
| 8476379 | Silphenylene skeleton-containing silicone type polymer and method for manufacturing the same | Hiroyuki Yasuda, Takato Sakurai, Hideto Kato | 2013-07-02 |
| 8378148 | Alcoholic hydroxyl-containing compounds and making method | Takato Sakurai, Michihiro Sugo, Hideto Kato | 2013-02-19 |
| 8367295 | Preparation process of chemically amplified resist composition | Keiichi Masunaga, Tamotsu Watanabe, Satoshi Watanabe, Ryuji Koitabashi, Osamu Watanabe | 2013-02-05 |
| 8343694 | Photomask blank, resist pattern forming process, and photomask preparation process | Ryuji Koitabashi, Satoshi Watanabe, Keiichi Masunaga, Tamotsu Watanabe | 2013-01-01 |
| 8263308 | Polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation | Shohei Tagami, Michihiro Sugo, Hideto Kato | 2012-09-11 |
| 8252518 | Chemically amplified positive resist composition and resist patterning process | Akinobu Tanaka, Satoshi Watanabe | 2012-08-28 |
| 8202677 | Chemically-amplified positive resist composition and patterning process thereof | Satoshi Watanabe, Youichi Ohsawa, Masaki Ohashi, Takeshi Kinsho | 2012-06-19 |
| 8193307 | Synthesis of photoresist polymer | Tamotsu Watanabe | 2012-06-05 |
| 8110335 | Resist patterning process and manufacturing photo mask | Satoshi Watanabe, Tamotsu Watanabe, Akinobu Tanaka, Keiichi Masunaga, Ryuji Koitabashi | 2012-02-07 |
| 7977027 | Resist composition and patterning process | Osamu Watanabe, Satoshi Watanabe, Youichi Ohsawa, Ryuji Koitabashi, Tamotsu Watanabe | 2011-07-12 |
| 7923195 | Positive resist composition and patterning process using the same | Jun Hatakeyama | 2011-04-12 |
| 7887991 | Positive resist composition and patterning process using the same | Jun Hatakeyama | 2011-02-15 |
| 7745104 | Bottom resist layer composition and patterning process using the same | Jun Hatakeyama, Toshihiko Fujii | 2010-06-29 |
| 7655378 | Negative resist composition and patterning process using the same | Jun Hatakeyama | 2010-02-02 |
| 7618763 | Resist composition and patterning process | Osamu Watanabe, Daisuke Manba, Tsugio Kaneda | 2009-11-17 |
| 7501223 | Polymer, resist composition and patterning process using the same | Osamu Watanabe, Satoshi Watanabe, Ryuji Koitabashi, Keiichi Masunaga, Tamotsu Watanabe | 2009-03-10 |
| 7491483 | Polymers, positive resist compositions and patterning process | Jun Hatakeyama, Takeshi Kinsho | 2009-02-17 |
| 7476486 | Resist composition and patterning process | Jun Hatakeyama | 2009-01-13 |
| 7449277 | Positive resist compositions and patterning process | Jun Hatakeyama, Takeshi Nagata | 2008-11-11 |