Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7416833 | Photoresist undercoat-forming material and patterning process | Jun Hatakeyama | 2008-08-26 |
| 7267923 | Resist composition and patterning process | Osamu Watanabe, Daisuke Manba | 2007-09-11 |
| 7232638 | Resist composition and patterning process | Jun Hatakeyama, Hideshi Kurihara, Osamu Watanabe | 2007-06-19 |
| 7135269 | Polymer, resist composition and patterning process | Jun Hatakeyama, Osamu Watanabe | 2006-11-14 |
| 6994945 | Silicon-containing polymer, resist composition and patterning process | Jun Hatakeyama, Toshinobu Ishihara, Tohru Kubota, Yasufumi Kubota | 2006-02-07 |
| 6994946 | Silicon-containing polymer, resist composition and patterning process | Jun Hatakeyama | 2006-02-07 |
| 6949323 | Resist composition and patterning process | Osamu Watanabe, Kazunori Maeda, Hiroshi Miyakoshi | 2005-09-27 |
| 6919161 | Silicon-containing polymer, resist composition and patterning process | Jun Hatakeyama, Toshinobu Ishihara | 2005-07-19 |
| 6902772 | Silicon-containing polymer, resist composition and patterning process | Jun Hatakeyama, Toshinobu Ishihara | 2005-06-07 |
| 6869748 | Resist composition and patterning process | Osamu Watanabe | 2005-03-22 |
| 6861198 | Negative resist material and pattern formation method using the same | Osamu Watanabe, Wataru Kusaki, Ryuji Koitabashi | 2005-03-01 |
| 6838224 | Chemical amplification, positive resist compositions | Youichi Ohsawa, Jun Watanabe, Akihiro Seki | 2005-01-04 |
| 6835804 | Preparation of polymer, and resist composition using the polymer | Osamu Watanabe | 2004-12-28 |
| 6746817 | Resist composition and patterning process | Jun Hatakeyama, Osamu Watanabe, Hiroshi Kubota | 2004-06-08 |
| 6737214 | Chemical amplification resist compositions | Osamu Watanabe, Kazuhiro Hirahara, Katsuya Takemura, Wataru Kusaki, Akihiro Seki | 2004-05-18 |
| 6682869 | Chemical amplification, positive resist compositions | Youichi Ohsawa, Jun Watanabe, Akihiro Seki | 2004-01-27 |
| 6653044 | Chemical amplification type resist composition | Osamu Watanabe, Jun Watanabe, Jun Hatakeyama, Tsunehiro Nishi, Takeshi Kinsho | 2003-11-25 |
| 6641975 | Resist composition and patterning process | Osamu Watanabe, Kazuhiro Hirahara, Kazunori Maeda, Wataru Kusaki, Shigehiro Nagura | 2003-11-04 |
| 6593056 | Chemically amplified positive resist composition and patterning method | Jun Watanabe, Katsuya Takemura, Kenji Koizumi | 2003-07-15 |
| 6455223 | Resist compositions and patterning process | Jun Hatakeyama, Tomohiro Kobayashi, Osamu Watanabe, Toshinobu Ishihara, Jun Watanabe | 2002-09-24 |
| 6414101 | Dendritic polymers and making method | Osamu Watanabe, Jun Hatakeyama, Tomohiro Kobayashi, Toshinobu Ishihara, Jun Watanabe | 2002-07-02 |
| 6312867 | Ester compounds, polymers, resist compositions and patterning process | Takeshi Kinsho, Tsunehiro Nishi, Hideshi Kurihara, Koji Hasegawa, Takeru Watanabe +3 more | 2001-11-06 |
| 6156481 | Positive resist composition | Osamu Watanabe, Jun Watanabe, Jun Hatakeyama, Youichi Ohsawa, Toshinobu Ishihara | 2000-12-05 |
| 5730901 | Silacyclohexane compounds, preparation thereof liquid crystal compositions comprising the same, and liquid crystal devices comprising the composition | Takaaki Shimizu, Tsutomu Ogihara, Tatsushi Kaneko, Koji Hasegawa | 1998-03-24 |
| 5725797 | Silacyclohexane compound, a process for producing the same, and a liquid crystal composition comprising the same | Kazuyuki Asakura, Takaaki Shimizu, Tsutomu Ogihara, Tatsushi Kaneko | 1998-03-10 |