Issued Patents All Time
Showing 1–25 of 89 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9233919 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Masaki Ohashi, Seiichiro Tachibana, Jun Hatakeyama | 2016-01-12 |
| 8900793 | Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition | Masayoshi Sagehashi, Koji Hasegawa, Tomohiro Kobayashi | 2014-12-02 |
| 8859181 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe, Jun Hatakeyama, Daisuke Domon | 2014-10-14 |
| 8822136 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama | 2014-09-02 |
| 8815492 | Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process | Masaki Ohashi, Takeshi Sasami, Jun Hatakeyama | 2014-08-26 |
| 8795942 | Positive resist composition and patterning process | Tomohiro Kobayashi, Ryosuke Taniguchi | 2014-08-05 |
| 8785105 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Masaki Ohashi, Seiichiro Tachibana, Jun Hatakeyama | 2014-07-22 |
| 8741546 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama, Masaki Ohashi | 2014-06-03 |
| 8741554 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama, Masaki Ohashi | 2014-06-03 |
| 8703384 | Positive resist composition and patterning process | Tomohiro Kobayashi, Eiji Fukuda, Takayuki Nagasawa, Ryosuke Taniguchi, Masayoshi Sagehashi +1 more | 2014-04-22 |
| 8691490 | Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process | Masaki Ohashi, Satoshi Watanabe, Keiichi Masunaga, Takeshi Kinsho | 2014-04-08 |
| 8686166 | Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom | Masayoshi Sagehashi, Takeru Watanabe, Koji Hasegawa, Masaki Ohashi | 2014-04-01 |
| 8632939 | Polymer, chemically amplified positive resist composition and pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Jun Hatakeyama, Daisuke Domon | 2014-01-21 |
| 8628908 | Chemically amplified resist composition and patterning process | Takeru Watanabe, Tomohiro Kobayashi, Masayoshi Sagehashi, Takeshi Nagata, Ryosuke Taniguchi | 2014-01-14 |
| 8609889 | Photoacid generator, resist composition, and patterning process | Masaki Ohashi, Takeshi Kinsho, Takeru Watanabe | 2013-12-17 |
| 8597869 | Sulfonium salt, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Takeshi Kinsho, Tomohiro Kobayashi | 2013-12-03 |
| 8535869 | Sulfonium salt, resist composition, and patterning process | Masayoshi Sagehashi, Tomohiro Kobayashi | 2013-09-17 |
| 8507175 | Patterning process and resist composition | Jun Hatakeyama, Masaki Ohashi, Kazuhiro Katayama | 2013-08-13 |
| 8426115 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama, Masaki Ohashi | 2013-04-23 |
| 8394570 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | Masaki Ohashi, Takeshi Kinsho, Satoshi Watanabe | 2013-03-12 |
| 8361693 | Chemically amplified positive photoresist composition and pattern forming process | Keiichi Masunaga, Akinobu Tanaka, Daisuke Domon, Satoshi Watanabe, Masaki Ohashi | 2013-01-29 |
| 8349533 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | Jun Hatakeyama, Takeru Watanabe, Takeshi Kinsho | 2013-01-08 |
| 8338078 | Photoresist undercoat-forming material and patterning process | Jun Hatakeyama, Toshihiko Fujii, Takeru Watanabe | 2012-12-25 |
| 8283104 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | Masaki Ohashi, Takeshi Kinsho | 2012-10-09 |
| 8202677 | Chemically-amplified positive resist composition and patterning process thereof | Takanobu Takeda, Satoshi Watanabe, Masaki Ohashi, Takeshi Kinsho | 2012-06-19 |