Issued Patents All Time
Showing 51–75 of 89 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7510816 | Silicon-containing resist composition and patterning process | Katsuya Takemura, Kazumi Noda | 2009-03-31 |
| 7511169 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Takeru Watanabe, Takeshi Kinsho, Katsuhiro Kobayashi | 2009-03-31 |
| 7498126 | Photoacid generators, chemically amplified resist compositions, and patterning process | Kazunori Maeda, Satoshi Watanabe | 2009-03-03 |
| 7494760 | Photoacid generators, chemically amplified resist compositions, and patterning process | Katsuya Takemura, Akihiro Seki | 2009-02-24 |
| 7459261 | Resist composition and patterning process using the same | Jun Hatakeyama, Seiichiro Tachibana | 2008-12-02 |
| 7335458 | Chemically amplified positive resist composition and patterning process | Kazunori Maeda, Satoshi Watanabe | 2008-02-26 |
| 7312016 | Chemically amplified positive resist composition and patterning process | Ryuji Koitabashi, Satoshi Watanabe | 2007-12-25 |
| 7303852 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | Jun Hatakeyama, Tomohiro Kobayashi | 2007-12-04 |
| 7288363 | Chemically amplified positive resist composition and patterning process | Ryuji Koitabashi, Satoshi Watanabe | 2007-10-30 |
| 7282316 | Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same | Katsuhiro Kobayashi, Takeshi Kinsho, Eiji Fukuda, Shigeo Tanaka | 2007-10-16 |
| 7235343 | Photoacid generators, chemically amplified resist compositions, and patterning process | Katsuhiro Kobayashi, Tatsushi Kaneko | 2007-06-26 |
| 7211367 | Photo acid generator, chemical amplification resist material | Tomohiro Kobayashi, Satoshi Watanabe, Tsunehiro Nishi, Katsuhiro Kobayashi | 2007-05-01 |
| 7109311 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Yoshitaka Yanagi, Kazunori Maeda | 2006-09-19 |
| 7105267 | Resist compositions and patterning process | Jun Hatakeyama, Tomohiro Kobayashi | 2006-09-12 |
| 7101651 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Yoshitaka Yanagi, Kazunori Maeda | 2006-09-05 |
| 7090961 | Photo acid generator, chemical amplification resist material and pattern formation method | Tomohiro Kobayashi, Satoshi Watanabe, Tsunehiro Nishi, Katsuhiro Kobayashi | 2006-08-15 |
| 7056640 | Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | Satoshi Watanabe, Kazunori Maeda | 2006-06-06 |
| 6916591 | Photoacid generators, chemically amplified resist compositions, and patterning process | Katsuhiro Kobayashi, Katsuya Takemura, Junji Tsuchiya, Kazunori Maeda | 2005-07-12 |
| 6916593 | Resist composition | Jun Hatakeyama, Takeru Watanabe | 2005-07-12 |
| 6838224 | Chemical amplification, positive resist compositions | Jun Watanabe, Takanobu Takeda, Akihiro Seki | 2005-01-04 |
| 6713612 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Koji Hasegawa, Takao Yoshihara, Kazunori Maeda, Toshihiko Fujii | 2004-03-30 |
| 6692893 | Onium salts, photoacid generators, resist compositions, and patterning process | Jun Watanabe, Takeshi Nagata, Jun Hatakeyama | 2004-02-17 |
| 6689530 | Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process | Katsuhiro Kobayashi, Kazunori Maeda | 2004-02-10 |
| 6682869 | Chemical amplification, positive resist compositions | Jun Watanabe, Takanobu Takeda, Akihiro Seki | 2004-01-27 |
| 6673511 | Resist composition | Jun Hatakeyama, Takeru Watanabe | 2004-01-06 |