Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9091925 | Method for forming silicon-containing resist underlayer film | Tsutomu Ogihara, Motoaki Iwabuchi | 2015-07-28 |
| 8945809 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | Koji Hasegawa, Masayoshi Sagehashi, Taku Morisawa, Yuji Harada | 2015-02-03 |
| 8741548 | Patterning process | Jun Hatakeyama, Katsuya Takemura, Yoshio Kawai | 2014-06-03 |
| 8192921 | Patterning process | Jun Hatakeyama, Kazuhiro Katayama | 2012-06-05 |
| 8105764 | Patterning process | Jun Hatakeyama, Toshinobu Ishihara | 2012-01-31 |
| 7771914 | Resist composition and patterning process | Jun Hatakeyama, Yuji Harada, Wataru Kusaki | 2010-08-10 |
| 7741015 | Patterning process and resist composition | Jun Hatakeyama, Takeshi Kinsho, Koji Hasegawa, Yoshio Kawai, Katsuya Takemura | 2010-06-22 |
| 7666571 | Polymer, resist composition and patterning process | Takeru Watanabe, Seiichiro Tachibana | 2010-02-23 |
| 7537880 | Polymer, resist composition, and patterning process | Yuji Harada, Jun Hatakeyama, Wataru Kusaki, Tomohiro Kobayashi, Koji Hasegawa | 2009-05-26 |
| 7514204 | Resist composition and patterning process | Jun Hatakeyama, Wataru Kusaki, Yuji Harada | 2009-04-07 |
| 6800551 | Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrate | Seiji Nagahara, Toyohisa Sakurada | 2004-10-05 |
| 6713612 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Koji Hasegawa, Kazunori Maeda, Toshihiko Fujii | 2004-03-30 |