Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12398152 | Thioxanthone derivatives, composition comprising the same and pattern forming method comprising said composition | Christopher Wall | 2025-08-26 |
| 11353793 | Method of simulating resist pattern, resist material and method of optimizing formulation thereof, apparatus and recording medium | — | 2022-06-07 |
| 11163236 | Method and process for stochastic driven detectivity healing | Michael A. Carcasi, Congque DINH, Mark H. Somervell | 2021-11-02 |
| 11061332 | Methods for sensitizing photoresist using flood exposures | Michael A. Carcasi, Mark H. Somervell | 2021-07-13 |
| 11029591 | Light source device and optical engine | — | 2021-06-08 |
| 10951004 | Light source device | — | 2021-03-16 |
| 10747121 | Optical processing apparatus and substrate processing apparatus | Teruhiko Moriya, Masaru Tomono, Ryo Shimada, Makoto Hayakawa | 2020-08-18 |
| 10558125 | Exposure apparatus, exposure apparatus adjustment method and storage medium | Teruhiko Moriya, Masaru Tomono, Ryo Shimada, Makoto Hayakawa | 2020-02-11 |
| 10534266 | Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes | Michael A. Carcasi, Joshua Hooge, Benjamen M. Rathsack | 2020-01-14 |
| 10527948 | Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage medium | Masaru Tomono, Nobutaka Fukunaga, Gousuke Shiraishi | 2020-01-07 |
| 10429745 | Photo-sensitized chemically amplified resist (PS-CAR) simulation | Michael A. Carcasi, Benjamen M. Rathsack, Mark H. Somervell, Wallace P. Printz, Seiichi Tagawa | 2019-10-01 |
| 10396262 | Light emitting device and substrate | Kazuma KOZURU | 2019-08-27 |
| 10274843 | Exposure apparatus, exposure method and storage medium | Masaru Tomono, Nobutaka Fukunaga, Gousuke Shiraishi, Yukie Minekawa | 2019-04-30 |
| 10215362 | Light source apparatus with lens array | Eiichiro Okahisa | 2019-02-26 |
| 10133163 | Light source unit and optical engine | — | 2018-11-20 |
| 10101669 | Exposure apparatus, resist pattern forming method, and storage medium | Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Shinichiro KAWAKAMI, Masaru Tomono +2 more | 2018-10-16 |
| 10073348 | Resist-pattern-forming method and chemically amplified resist material | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima | 2018-09-11 |
| 10073349 | Chemically amplified resist material, pattern-forming method, compound, and production method of compound | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima | 2018-09-11 |
| 10025187 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | Seiichi Tagawa, Akihiro Oshima | 2018-07-17 |
| 10025190 | Substrate treatment system | Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Shinichiro KAWAKAMI, Masaru Tomono +2 more | 2018-07-17 |
| 9971247 | Pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima | 2018-05-15 |
| 9709882 | Light source apparatus and projector having light source apparatus | Takashi Sasamuro | 2017-07-18 |
| 9618848 | Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes | Michael A. Carcasi, Joshua Hooge, Benjamen M. Rathsack | 2017-04-11 |
| 9519227 | Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR) | Michael A. Carcasi, Mark H. Somervell, Joshua Hooge, Benjamen M. Rathsack | 2016-12-13 |
| 9500936 | Light source device, and optical engine in which light source device is used | — | 2016-11-22 |