Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11705331 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori | 2023-07-18 |
| 11460767 | Composition for film formation, film-forming method and directed self-assembly lithography process | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori | 2022-10-04 |
| 11370872 | Composition for pattern formation, and pattern-forming method | Masafumi Hori, Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki | 2022-06-28 |
| 11335559 | Pattern-forming method, and composition | Hiroyuki Komatsu, Tomohiro Oda, Masafumi Hori, Tomoki Nagai | 2022-05-17 |
| 11211246 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori | 2021-12-28 |
| 11204552 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | Tomoki Nagai, Ken MARUYAMA, Motohiro SHIRATANI, Hisashi Nakagawa | 2021-12-21 |
| 10950438 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori | 2021-03-16 |
| 10725376 | Pattern-forming method | Hisashi Nakagawa, Motohiro SHIRATANI | 2020-07-28 |
| 10691019 | Pattern-forming method and composition | Hiroyuki Komatsu, Masafumi Hori, Hitoshi Osaki, Tomohiro Oda | 2020-06-23 |
| 10520815 | Pattern-forming method | Tomohisa Fujisawa, Motohiro SHIRATANI, Hisashi Nakagawa | 2019-12-31 |
| 10146130 | Composition for base, and directed self-assembly lithography method | Hiroyuki Komatsu, Shinya Minegishi, Kaori Sakai, Tomoki Nagai | 2018-12-04 |
| 10120282 | Chemically amplified resist material and resist pattern-forming method | Hisashi Nakagawa, Tomoki Nagai | 2018-11-06 |
| 10073348 | Resist-pattern-forming method and chemically amplified resist material | Hisashi Nakagawa, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara | 2018-09-11 |
| 10073349 | Chemically amplified resist material, pattern-forming method, compound, and production method of compound | Hisashi Nakagawa, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara | 2018-09-11 |
| 10018911 | Chemically amplified resist material and resist pattern-forming method | Hisashi Nakagawa, Tomoki Nagai | 2018-07-10 |
| 9989849 | Chemically amplified resist material and resist pattern-forming method | Hisashi Nakagawa, Tomoki Nagai | 2018-06-05 |
| 9971247 | Pattern-forming method | Hisashi Nakagawa, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara | 2018-05-15 |
| 9939729 | Resist pattern-forming method | Hisashi Nakagawa, Tomoki Nagai | 2018-04-10 |
| 9738746 | Composition for pattern formation, pattern-forming method, and block copolymer | Hiroyuki Komatsu, Tomoki Nagai | 2017-08-22 |
| 9690192 | Composition for base, and directed self-assembly lithography method | Hiroyuki Komatsu, Shinya Minegishi, Kaori Sakai, Tomoki Nagai | 2017-06-27 |
| 9598520 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | Yuko Kiridoshi, Yukio Nishimura, Yusuke Asano, Takanori Kawakami, Hiromitsu Nakashima | 2017-03-21 |
| 9599892 | Composition for pattern formation, and pattern-forming method | Hiroyuki Komatsu, Shinya Minegishi, Tomoki Nagai | 2017-03-21 |
| 9587065 | Composition for pattern formation, and pattern-forming method | Hiroyuki Komatsu, Shinya Minegishi, Tomoki Nagai | 2017-03-07 |
| 9557644 | Base film-forming composition, and directed self-assembly lithography method | Hiroyuki Komatsu, Shinya Minegishi, Kaori Sakai, Tomoki Nagai | 2017-01-31 |
| 9534135 | Composition for pattern formation, and pattern-forming method | Hiroyuki Komatsu, Shinya Minegishi, Tomoki Nagai | 2017-01-03 |