Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12078511 | Mounting member and motion guidance apparatus including the mounting member | Yuta Tsujisawa | 2024-09-03 |
| 11506976 | Radiation-sensitive composition and resist pattern-forming method | Hisashi Nakagawa, Shinya Minegishi | 2022-11-22 |
| 11371909 | Lifespan diagnosis device, method, non-transitory storage medium, and system for motion guidance device | Akihiro Unno, Yuki Hayashi, Yuki Tanaka, Tomofumi Ohashi, Katsunori Kogure | 2022-06-28 |
| 11226001 | Machining control system and motion guidance device | Akihiro Unno, Yuki Hayashi, Yuki Tanaka, Tomofumi Ohashi, Katsunori Kogure | 2022-01-18 |
| 11079676 | Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof | Hisashi Nakagawa, Shinya Minegishi | 2021-08-03 |
| 10920825 | Motion guide device load measuring system and load measuring method, and motion guide device service life calculating method | Tetsuhiro Nishide, Takuya Horie, Shinji Aoki, Hiroyuki Takizawa | 2021-02-16 |
| 10844904 | Workpiece transport control system and motion guidance device | Akihiro Unno, Yuki Hayashi, Yuki Tanaka, Tomofumi Ohashi, Katsunori Kogure | 2020-11-24 |
| 10738827 | Management system and motion guidance device | Akihiro Unno, Yuki Hayashi, Yuki Tanaka, Tomofumi Ohashi, Katsunori Kogure | 2020-08-11 |
| 10239982 | Block polymers for sub-10 nm patterning | Carlton G. Willson, Gregory Blachut, Michael J. Maher, Christopher John Ellison | 2019-03-26 |
| 9598520 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | Yuko Kiridoshi, Takehiko Naruoka, Yukio Nishimura, Takanori Kawakami, Hiromitsu Nakashima | 2017-03-21 |
| 9523911 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | Hiroshi Tomioka, Takakazu Kimoto | 2016-12-20 |
| 9261780 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | Yoshifumi Oizumi, Akimasa Soyano, Takeshi Ishii | 2016-02-16 |
| 9188858 | Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound | — | 2015-11-17 |
| 9146466 | Resist composition, resist pattern-forming method, and resist solvent | Shin Nakamura, Tomonori Futai | 2015-09-29 |
| 9046765 | Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film | Hiromitsu Nakashima, Toru Kimura, Masafumi Hori, Reiko Kimura, Kazuki Kasahara +2 more | 2015-06-02 |
| 9040221 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | Hitoshi Osaki, Mitsuo Sato, Tomoki Nagai | 2015-05-26 |
| 8765355 | Radiation sensitive resin composition, method for forming a pattern, polymer and compound | Takakazu Kimoto, Mitsuo Sato, Tomohiro Kakizawa | 2014-07-01 |
| 8603726 | Radiation-sensitive resin composition, polymer and compound | Kazuo Nakahara, Mitsuo Sato | 2013-12-10 |
| 8580480 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound | Mitsuo Sato | 2013-11-12 |