Issued Patents All Time
Showing 25 most recent of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10239982 | Block polymers for sub-10 nm patterning | Gregory Blachut, Michael J. Maher, Yusuke Asano, Christopher John Ellison | 2019-03-26 |
| 9834700 | Polylactide/silicon-containing block copolymers for nanolithography | Christopher John Ellison, Julia Cushen, Christopher M. Bates | 2017-12-05 |
| 9314819 | Anhydride copolymer top coats for orientation control of thin film block copolymers | Christopher John Ellison, Takehiro Seshimo, Julia Cushen, Christopher M. Bates, Leon Dean +3 more | 2016-04-19 |
| 9223202 | Method of automatic fluid dispensing for imprint lithography processes | Byung-Jin Choi, Sidlgata V. Sreenivasan, Mattherw E. Colburn, Todd C. Bailey, John Ekerdt | 2015-12-29 |
| 9157008 | Anhydride copolymer top coats for orientation control of thin film block copolymers | Christopher John Ellison, Takehiro Seshimo, Julia Cushen, Christopher M. Bates, Leon Dean +2 more | 2015-10-13 |
| 9120117 | Polylactide/silicon-containing block copolymers for nanolithography | Christopher John Ellison, Julia Cushen, Christopher M. Bates | 2015-09-01 |
| 8926888 | Fluorinated silazane release agents in nanoimprint lithography | Tsuyoshi Ogawa, Michael W. Lin, Daniel J. Hellebusch, B. Michael Jacobsson, William K. Bell | 2015-01-06 |
| 8033814 | Device for holding a template for use in imprint lithography | Todd C. Bailey, Byung-Jin Choi, Matthew E. Colburn, Sidlgata V. Sreenivasan, John Ekerdt | 2011-10-11 |
| 7906060 | Compositions for dark-field polymerization and method of using the same for imprint lithography processes | Nicholas A. Stacey | 2011-03-15 |
| 7708542 | Device for holding a template for use in imprint lithography | Todd C. Bailey, Byung-Jin Choi, Matthew E. Colburn, Sidlgata V. Sreenivasan, John Ekerdt | 2010-05-04 |
| 7229273 | Imprint lithography template having a feature size under 250 nm | Todd C. Bailey, Byung-Jin Choi, Matthew E. Colburn, Sidlgata V. Sreenivasan, John Ekerdt | 2007-06-12 |
| 6964793 | Method for fabricating nanoscale patterns in light curable compositions using an electric field | Sidlgata V. Sreenivasan, Roger T. Bonnecaze | 2005-11-15 |
| 6908861 | Method for imprint lithography using an electric field | Sidlgata V. Sreenivasan, Roger T. Bonnecaze | 2005-06-21 |
| 6890688 | Lithographic template and method of formation and use | David Mancini, Douglas J. Resnick | 2005-05-10 |
| 6719915 | Step and flash imprint lithography | Matthew E. Colburn | 2004-04-13 |
| 6334960 | Step and flash imprint lithography | Matthew E. Colburn | 2002-01-01 |
| 5807947 | Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene | Richard Vicari, Douglas J. Gordon, William D. Hinsberg, Dennis McKean, Ralph R. Dammel | 1998-09-15 |
| 5545509 | Photoresist composition with photosensitive base generator | James F. Cameron, Jean M. J. Frechet, Man-Kit Leung, Claus-Peter Niesert, Scott A. MacDonald | 1996-08-13 |
| 5342727 | Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition | Richard Vicari, Douglas J. Gordon, William D. Hinsberg, Dennis McKean, Ralph R. Dammel | 1994-08-30 |
| 5322765 | Dry developable photoresist compositions and method for use thereof | Nicholas J. Clecak, Willard E. Conley, Ranee W. Kwong, Leo L. Linehan, Scott A. MacDonald +2 more | 1994-06-21 |
| 5270151 | Spin on oxygen reactive ion etch barrier | Peter A. Agostino, Ajay P. Giri, Hiroyuki Hiraoka, Daniel J. Dawson | 1993-12-14 |
| 5250395 | Process for imaging of photoresist including treatment of the photoresist with an organometallic compound | Robert David Allen, Scott A. MacDonald, Dennis McKean, Hubert Schlosser, Robert J. Twieg +1 more | 1993-10-05 |
| 5055439 | Photoacid generating composition and sensitizer therefor | Robert David Allen, William D. Hinsberg, Logan L. Simpson, Robert J. Twieg, Gregory Michael Wallraff | 1991-10-08 |
| 4939070 | Thermally stable photoresists with high sensitivity | William R. Brunsvold, Ming-Fea Chow, Willard E. Conley, Dale M. Crockatt, Jean M. J. Frechet +3 more | 1990-07-03 |
| 4908298 | Method of creating patterned multilayer films for use in production of semiconductor circuits and systems | George J. Hefferon, Hiroshi Ito, Scott A. MacDonald | 1990-03-13 |