Issued Patents All Time
Showing 1–25 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12411409 | Aromatic underlayer | Sheng Liu, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Daniel Greene +3 more | 2025-09-09 |
| 12379660 | Adhesion promoting photoresist underlayer composition | Joshua Kaitz, Ke Yang, Keren Zhang, Li Cui, Dan B. Millward +1 more | 2025-08-05 |
| 12287576 | Underlayer compositions and patterning methods | Joshua Kaitz, Sheng Liu, Li Cui, Shintaro Yamada, Emad Aqad +2 more | 2025-04-29 |
| 12276910 | Photoresist compositions and pattern formation methods | Emad Aqad, Brandon Wenning, Choong-Bong Lee, James W. Thackeray, Ke Yang | 2025-04-15 |
| 12099300 | Aromatic underlayer | Sheng Liu, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Daniel Greene +3 more | 2024-09-24 |
| 12085854 | Photoresist compositions and pattern formation methods | Cong Liu, Jong Keun Park, Sheng Liu, Tsutomu Asazuma, Mingqi Li | 2024-09-10 |
| 11960206 | Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device | Emad Aqad, William Williams, III | 2024-04-16 |
| 11947258 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | Emad Aqad, James W. Thackeray | 2024-04-02 |
| 11940732 | Coating compositions and methods of forming electronic devices | Sheng Liu, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Suzanne M. Coley +3 more | 2024-03-26 |
| 11932713 | Monomers, polymers and lithographic compositions comprising same | Emad Aqad, James W. Thackeray | 2024-03-19 |
| 11880134 | Salts and photoresists comprising same | Emad Aqad, James W. Thackeray | 2024-01-23 |
| 11852972 | Photoresist compositions and pattern formation methods | Tomas Marangoni, Emad Aqad, James W. Thackeray, Xisen Hou, ChoongBong Lee | 2023-12-26 |
| 11817316 | Coating compositions and methods of forming electronic devices | Sheng Liu, Iou-Sheng Ke, Shintaro Yamada, Li Cui | 2023-11-14 |
| 11733609 | Silicon-containing underlayers | Charlotte Cutler, Li Cui, Shintaro Yamada, Paul J. LaBeaume, Suzanne M. Coley +1 more | 2023-08-22 |
| 11613519 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | Emad Aqad, James W. Thackeray | 2023-03-28 |
| 11550217 | Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device | Emad Aqad, William Williams, III | 2023-01-10 |
| 11506979 | Method using silicon-containing underlayers | Li Cui, Paul J. LaBeaume, Charlotte Cutler, Suzanne M. Coley, Shintaro Yamada +1 more | 2022-11-22 |
| 11505565 | Zwitterion compounds and photoresists comprising same | Emad Aqad, James W. Thackeray | 2022-11-22 |
| 11448960 | Salts and photoresists comprising same | Emad Aqad, James W. Thackeray | 2022-09-20 |
| 11360387 | Silicon-containing underlayers | Li Cui, Paul J. LaBeaume, Charlotte Cutler, Shintaro Yamada, Suzanne M. Coley +1 more | 2022-06-14 |
| 11175581 | Aromatic resins for underlayers | Sheng Liu, Shintaro Yamada, Li Cui, Suzanne M. Coley, Joshua Kaitz +1 more | 2021-11-16 |
| 11042093 | Gap-filling method | Keren Zhang, Li Cui, Daniel Greene, Shintaro Yamada | 2021-06-22 |
| 10962880 | Radiation-sensitive compositions and patterning and metallization processes | Mitsuru Haga, Shugaku Kushida, Kunio Kainuma | 2021-03-30 |
| 10901316 | Iodine-containing polymers for chemically amplified resist compositions | Emad Aqad, James W. Thackeray | 2021-01-26 |
| 10894848 | Polyarylene resins | Charles R. Kinzie, Daniel Greene, Christopher Gilmore, Ping Ding, Qing Min Wang +1 more | 2021-01-19 |