CC

Charlotte Cutler

RM Rohm And Haas Electronic Materials: 8 patents #76 of 562Top 15%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
DI Dupont Electronic Materials International: 1 patents #11 of 36Top 35%
TL Toyko Electron Limited: 1 patents #1 of 31Top 4%
📍 Albany, NY: #134 of 790 inventorsTop 20%
🗺 New York: #12,360 of 115,490 inventorsTop 15%
Overall (All Time): #396,287 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12411412 Patterning semiconductor features Michael Murphy, David Conklin 2025-09-09
12394618 Method of adjusting wafer shape using multi-directional actuation films Michael Murphy, Anthony R. Schepis 2025-08-19
12282254 Photoresist compositions and pattern formation methods Irvinder Kaur, Ke Yang, Mingqi Li 2025-04-22
11747733 Freeze-less methods for self-aligned double patterning Michael Murphy 2023-09-05
11733609 Silicon-containing underlayers Li Cui, Shintaro Yamada, Paul J. LaBeaume, Suzanne M. Coley, James F. Cameron +1 more 2023-08-22
11506979 Method using silicon-containing underlayers Li Cui, Paul J. LaBeaume, Suzanne M. Coley, Shintaro Yamada, James F. Cameron +1 more 2022-11-22
11360387 Silicon-containing underlayers Li Cui, Paul J. LaBeaume, James F. Cameron, Shintaro Yamada, Suzanne M. Coley +1 more 2022-06-14
10114288 Silicon-containing underlayers Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Li Cui +3 more 2018-10-30
10031420 Wet-strippable silicon-containing antireflectant Owendi Ongayi, Mingqi Li, Shintaro Yamada, James F. Cameron 2018-07-24
10007184 Silicon-containing underlayers Li Cui, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume +3 more 2018-06-26
9442377 Wet-strippable silicon-containing antireflectant Owendi Ongayi, Mingqi Li, Shintaro Yamada, James F. Cameron 2016-09-13
8778601 Methods of forming photolithographic patterns Seokho KANG 2014-07-15