Issued Patents All Time
Showing 1–25 of 80 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12282254 | Photoresist compositions and pattern formation methods | Irvinder Kaur, Charlotte Cutler, Ke Yang | 2025-04-22 |
| 12234369 | Photoresist topcoat compositions and methods of processing photoresist compositions | Irvinder Kaur, Chunyi Wu, Joshua Kaitz, Doris Kang, Xisen Hou +1 more | 2025-02-25 |
| 12085854 | Photoresist compositions and pattern formation methods | Cong Liu, Jong Keun Park, James F. Cameron, Sheng Liu, Tsutomu Asazuma | 2024-09-10 |
| 11940730 | Photoresist compositions and pattern formation methods | Mitsuru Haga | 2024-03-26 |
| 11859082 | Polymers useful as surface leveling agents | Irvinder Kaur | 2024-01-02 |
| 11846885 | Topcoat compositions and photolithographic methods | Cong Liu, Doris Kang, Deyan Wang, Cheng-Bai Xu, Chunyi Wu | 2023-12-19 |
| 11829069 | Photoresist compositions and methods | Joshua Kaitz, Tomas Marangoni, Emad Aqad, Amy M. Kwok, Thomas Cardolaccia +3 more | 2023-11-28 |
| 11809077 | Photoresist compositions and pattern formation methods | Thomas Cardolaccia, Jason A. DeSisto, Choong-Bong Lee, Tomas Marangoni, Chunyi Wu +2 more | 2023-11-07 |
| 11754927 | Photoresist pattern trimming compositions and pattern formation methods | Irvinder Kaur, Colin Liu, Xisen Hou, Kevin Rowell, Cheng-Bai Xu | 2023-09-12 |
| 11506981 | Photoresist pattern trimming compositions and pattern formation methods | Xisen Hou, Irvinder Kaur, Cong Liu, Kevin Rowell, Cheng-Bai Xu | 2022-11-22 |
| 11106137 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Cong Liu, Joon Seok Oh, Cheng-Bai Xu, Doris Kang +2 more | 2021-08-31 |
| 10809616 | Cholate photoacid generators and photoresists comprising same | Emad Aqad, Joseph Mattia, Cheng-Bai Xu | 2020-10-20 |
| 10719014 | Photoresists comprising amide component | Cong Liu, Chunyi Wu, Gerhard Pohlers, Gregory P. Prokopowicz, Cheng-Bai Xu | 2020-07-21 |
| 10684549 | Pattern-formation methods | Kevin Rowell, Cong Liu, Cheng-Bai Xu, Irvinder Kaur, Xisen Hou | 2020-06-16 |
| 10670965 | Polymers and photoresist compositions | Emad Aqad, Cong Liu, Cheng-Bai Xu | 2020-06-02 |
| 10578969 | Photoresist topcoat compositions and methods of processing photoresist compositions | Cong Liu, Doris Kang, Deyan Wang, Cheng-Bai Xu, Irvinder Kaur | 2020-03-03 |
| 10481495 | Topcoat compositions containing fluorinated thermal acid generators | Irvinder Kaur, Doris Kang, Cong Liu, Gerhard Pohlers | 2019-11-19 |
| 10287455 | Methods for manufacturing block copolymers and articles manufactured therefrom | Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Jeffrey D. Weinhold | 2019-05-14 |
| 10241411 | Topcoat compositions containing fluorinated thermal acid generators | Irvinder Kaur, Doris Kang, Cong Liu, Gerhard Pohlers | 2019-03-26 |
| 10241407 | Thermal acid generators and photoresist pattern trimming compositions and methods | Irvinder Kaur, Cong Liu, Kevin Rowell, Gerhard Pohlers | 2019-03-26 |
| 10197918 | Photoresist topcoat compositions and methods of processing photoresist compositions | Cong Liu, Doris Kang, Deyan Wang, Cheng-Bai Xu, Irvinder Kaur | 2019-02-05 |
| 10167411 | Neutral layer polymers, methods of manufacture thereof and articles comprising the same | Peter Trefonas, III, Phillip D. Hustad, Deyan Wang, Rahul Sharma, Jieqian Zhang | 2019-01-01 |
| 10162265 | Pattern treatment methods | Jong Keun Park, Amy M. Kwok, Phillip D. Hustad | 2018-12-25 |
| 10133179 | Pattern treatment methods | Jin Wuk Sung, Jong Keun Park, Joshua Kaitz, Vipul Jain, Chunyi Wu +1 more | 2018-11-20 |
| 10114288 | Silicon-containing underlayers | Charlotte Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume +3 more | 2018-10-30 |