Issued Patents All Time
Showing 1–25 of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12024640 | UV-curing resin compositions for hard coat applications | Michael Mulzer, Kenneth Hernandez, Andrew J. Stella, Lujia Bu, Jieqian Zhang +1 more | 2024-07-02 |
| 11999844 | Optically clear shear thickening fluids and optical display device comprising same | Yixuan Song | 2024-06-04 |
| 11940732 | Coating compositions and methods of forming electronic devices | Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang +3 more | 2024-03-26 |
| 11846885 | Topcoat compositions and photolithographic methods | Cong Liu, Doris Kang, Cheng-Bai Xu, Mingqi Li, Chunyi Wu | 2023-12-19 |
| 11572476 | Anti-reflective coating | Sheng Liu | 2023-02-07 |
| 11332559 | Polymers for display devices | Yixuan Song, Lujia Bu, Neelima Chandrayan, Anton Li, Jieqian Zhang | 2022-05-17 |
| 11106137 | Compositions comprising base-reactive component and processes for photolithography | Cong Liu, Mingqi Li, Joon Seok Oh, Cheng-Bai Xu, Doris Kang +2 more | 2021-08-31 |
| 10794866 | Acoustic wave sensors and methods of sensing a gas-phase analyte | Christopher Gilmore, Aaron A. Rachford, Hee Jae Yoon, Jaclyn Murphy, Peter Trefonas, III | 2020-10-06 |
| 10578969 | Photoresist topcoat compositions and methods of processing photoresist compositions | Cong Liu, Doris Kang, Cheng-Bai Xu, Mingqi Li, Irvinder Kaur | 2020-03-03 |
| 10558122 | Compositions comprising sulfonamide material and processes for photolithography | Chunyi Wu, George G. Barclay, Cheng-Bai Xu | 2020-02-11 |
| 10359698 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | Cheng-Bai Xu, George G. Barclay | 2019-07-23 |
| 10222699 | Compositions and processes for immersion lithography | Cheng-Bai Xu, George G. Barclay | 2019-03-05 |
| 10197918 | Photoresist topcoat compositions and methods of processing photoresist compositions | Cong Liu, Doris Kang, Cheng-Bai Xu, Mingqi Li, Irvinder Kaur | 2019-02-05 |
| 10180627 | Processes for photolithography | George G. Barclay, Thomas A. Estelle, Kenneth J. Spizuoco, Doris Kang | 2019-01-15 |
| 10167411 | Neutral layer polymers, methods of manufacture thereof and articles comprising the same | Peter Trefonas, III, Phillip D. Hustad, Rahul Sharma, Mingqi Li, Jieqian Zhang | 2019-01-01 |
| 10042259 | Topcoat compositions and pattern-forming methods | Irvinder Kaur, Cong Liu, Doris Kang, Mingqi Li, Huaxing Zhou | 2018-08-07 |
| 9958780 | Coating compositions for photoresists | Peter Trefonas, III, Michael K. Gallagher | 2018-05-01 |
| 9868820 | Polyarylene materials | Christopher Gilmore, Lujia Bu, Peng-Wei Chuang, Yerang Kang, Ping Ding +2 more | 2018-01-16 |
| 9802400 | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers | Peter Trefonas, III, Rahul Sharma, Phillip D. Hustad, Mingqi Li | 2017-10-31 |
| 9696627 | Compositions comprising base-reactive component and processes for photolithography | Jinrong Liu, Cong Liu, Doris Kang, Anthony Zampini, Cheng-Bai Xu | 2017-07-04 |
| 9696622 | Compositions and processes for immersion lithography | — | 2017-07-04 |
| 9562169 | Metal hardmask compositions | Jibin Sun, Peter Trefonas, III, Kathleen M. O'Connell | 2017-02-07 |
| 9563128 | Compositions and processes for immersion lithography | — | 2017-02-07 |
| 9563126 | Hardmask | Shintaro Yamada, Sabrina Wong, Cong Liu, Cheng-Bai Xu | 2017-02-07 |
| 9515272 | Display device manufacture using a sacrificial layer interposed between a carrier and a display device substrate | Young Seok Kim, Yerang Kang, Christopher Gilmore, Kathleen M. O'Connell, Moo Young Lee +1 more | 2016-12-06 |