Issued Patents All Time
Showing 1–25 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10558122 | Compositions comprising sulfonamide material and processes for photolithography | Deyan Wang, Chunyi Wu, Cheng-Bai Xu | 2020-02-11 |
| 10359698 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | Deyan Wang, Cheng-Bai Xu | 2019-07-23 |
| 10222699 | Compositions and processes for immersion lithography | Deyan Wang, Cheng-Bai Xu | 2019-03-05 |
| 10180627 | Processes for photolithography | Deyan Wang, Thomas A. Estelle, Kenneth J. Spizuoco, Doris Kang | 2019-01-15 |
| 9507260 | Compositions and processes for photolithography | Deyan Wang, Chunyi Wu, Cheng-Bai Xu | 2016-11-29 |
| 9255079 | Photoacid generators and photoresists comprising same | Mingqi Li, Emad Aqad, Cong Liu, Joseph Mattia, Cheng-Bai Xu | 2016-02-09 |
| 9244355 | Compositions and processes for immersion lithography | Stefan J. Caporale, Deyan Wang, Li Jia | 2016-01-26 |
| 9209028 | Ion implantation methods | Cheng-Bai Xu, Cheng-Han Wu, Dong Won Chung, Yoshihiro Yamamoto, Gerhard Pohlers | 2015-12-08 |
| 9012128 | Photoresist and coated substrate comprising same | Deyan Wang, Chunyi Wu, Cong Liu, Gerhard Pohlers, Cheng-Bai Xu | 2015-04-21 |
| 9005880 | Compositions comprising sulfonamide material and processes for photolithography | Deyan Wang, Chunyi Wu, Cheng-Bai Xu | 2015-04-14 |
| 8975006 | Compositions comprising carboxy component and processes for photolithography | Deyan Wang, Charles R. Szmanda, Cheng-Bai Xu | 2015-03-10 |
| 8871428 | Compositions and processes for immersion lithography | Deyan Wang, Cheng-Bai Xu | 2014-10-28 |
| 8722825 | Surface active additive and photoresist composition comprising same | Deyan Wang, Chunyi Wu, Cong Liu, Gerhard Pohlers, Cheng-Bai Xu | 2014-05-13 |
| 8506788 | Leveler compounds | Deyan Wang, Robert D. Mikkola | 2013-08-13 |
| 8262891 | Leveler compounds | Deyan Wang, Robert D. Mikkola | 2012-09-11 |
| 8257902 | Compositons and processes for immersion lithography | Deyan Wang, Cheng-Bai Xu | 2012-09-04 |
| 7700256 | Phenolic/alicyclic copolymers and photoresists | Ashish A. Pandya, Wang Yueh, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao | 2010-04-20 |
| 7662981 | Leveler compounds | Deyan Wang, Robert D. Mikkola, Chunyi Wu | 2010-02-16 |
| 7582412 | Multilayer photoresist systems | James F. Cameron, Dana Gronbeck | 2009-09-01 |
| 7510639 | Leveler compounds | Deyan Wang, Robert D. Mikkola, Chunyi Wu | 2009-03-31 |
| 7390608 | Photoresists containing Si-polymers | Subbareddy Kanagasabapathy | 2008-06-24 |
| 7306892 | Multilayer photoresist system | James F. Cameron | 2007-12-11 |
| 7297616 | Methods, photoresists and substrates for ion-implant lithography | James F. Cameron, Peter Trefonas, III, Jin Wuk Sung | 2007-11-20 |
| 7244542 | Resins and photoresist compositions comprising same | Young Cheol Bae | 2007-07-17 |
| 7217490 | Processes for producing silane monomers and polymers and photoresist compositions comprising same | Subbareddy Kanagasabapathy, Matthew A. King | 2007-05-15 |