Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9171731 | Method of forming the gate with the LELE double pattern | Jun Huang, Quanbo Li, ZhiFeng Gan, Runling Li | 2015-10-27 |
| 8962494 | Method of manufacturing dual gate oxide devices | Jun Huang, Ermin Chong | 2015-02-24 |
| 8823936 | Structure for critical dimension and overlay measurement | Yunqing Dai, Jian Wang | 2014-09-02 |
| 8518825 | Method to manufacture trench-first copper interconnection | — | 2013-08-27 |
| 7700256 | Phenolic/alicyclic copolymers and photoresists | George G. Barclay, Ashish A. Pandya, Wang Yueh, Anthony Zampini, Gary Ganghui Teng | 2010-04-20 |
| 7183037 | Antireflective coatings with increased etch rates | Suzanne M. Coley, Timothy G. Adams | 2007-02-27 |
| 7090968 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | George G. Barclay, Robert J. Kavanagh | 2006-08-15 |
| 6849381 | Copolymers and photoresist compositions comprising same | George G. Barclay, Stefan J. Caporale, Wang Yueh, Joseph Mattia | 2005-02-01 |
| 6777157 | Copolymers and photoresist compositions comprising same | George G. Barclay, Stefan J. Caporale, Wang Yueh, Joseph Mattia | 2004-08-17 |
| 6692888 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | George G. Barclay, Robert J. Kavanagh | 2004-02-17 |
| 6492086 | Phenolic/alicyclic copolymers and photoresists | George G. Barclay, Ashish A. Pandya, Wang Yueh, Anthony Zampini, Gary Ganghui Teng | 2002-12-10 |