Wang Yueh — 23 Patents at Intel

Wang Yueh has been granted 23 US patents while listed as an inventor at Intel. The first was granted in 2001 and the most recent in January 2011. Wang Yueh ranks #178,160 of 4,157,543 US inventors in our database (top 4.3%). Patent records list Wang Yueh in Shrewsbury, MA, US.

Issued Patents All Time

Showing 1–23 of 23 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
7867687	Methods and compositions for reducing line wide roughness	Huey-Chiang Liou, Hai Deng, Hok-Kin Choi	2011-01-11	$23,642,000
7700256	Phenolic/alicyclic copolymers and photoresists	George G. Barclay, Ashish A. Pandya, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao	2010-04-20
7678527	Methods and compositions for providing photoresist with improved properties for contacting liquids	Robert Meagley, Ernisse Putna	2010-03-16	$22,589,000
7459260	Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method	Manish Chandhok, Heidi Cao	2008-12-02	$16,850,000
7442487	Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists	Heidi Cao, Manish Chandhok	2008-10-28	$18,166,000
7427463	Photoresists with reduced outgassing for extreme ultraviolet lithography	Heidi Cao	2008-09-23	$21,762,000
7241560	Basic quencher/developer solutions for photoresists	Shan Clark, Kim-Khanh Ho, James S. Clarke, Ernisse Putna, Robert Meagley	2007-07-10	$14,625,000
7226718	Non-outgassing low activation energy resist	Heidi Cao, Jeanette M. Roberts	2007-06-05	$17,840,000
7147986	Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages	Heidi Cao	2006-12-12	$16,980,000
7147985	Resist compounds including acid labile groups having hydrophilic groups attached thereto	Ernisse Putna	2006-12-12	$16,980,000
7125793	Method for forming an opening for an interconnect structure in a dielectric layer having a photosensitive material	Huey-Chiang Liou	2006-10-24	$13,658,000
7118847	Polymer and photoresist compositions	Charles R. Szmanda, George G. Barclay, Peter Trefonas, III	2006-10-10
7105266	Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same	George G. Barclay	2006-09-12
7022454	Monomers, polymers, methods of synthesis thereof and photoresist compositions	George G. Barclay, Joseph Mattia	2006-04-04
7005227	One component EUV photoresist	Heidi Cao	2006-02-28	$11,249,000
6864192	Langmuir-blodgett chemically amplified photoresist	Huey-Chiang Liou, Hai Deng, Hok-Kin Choi	2005-03-08	$33,547,000
6849381	Copolymers and photoresist compositions comprising same	George G. Barclay, Stefan J. Caporale, Zhibiao Mao, Joseph Mattia	2005-02-01
6777157	Copolymers and photoresist compositions comprising same	George G. Barclay, Stefan J. Caporale, Zhibiao Mao, Joseph Mattia	2004-08-17
6680159	Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same	George G. Barclay	2004-01-20
6599677	Polymer and photoresist compositions	Charles R. Szmanda, George G. Barclay, Peter Trefonas, III	2003-07-29
6492086	Phenolic/alicyclic copolymers and photoresists	George G. Barclay, Ashish A. Pandya, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao	2002-12-10
6406828	Polymer and photoresist compositions	Charles R. Szmanda, George G. Barclay, Peter Trefonas, III	2002-06-18
6306554	Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same	George G. Barclay	2001-10-23

Wang Yueh — 23 Patents

Issued Patents All Time

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