| 7867687 |
Methods and compositions for reducing line wide roughness |
Huey-Chiang Liou, Hai Deng, Hok-Kin Choi |
2011-01-11 |
| 7700256 |
Phenolic/alicyclic copolymers and photoresists |
George G. Barclay, Ashish A. Pandya, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao |
2010-04-20 |
| 7678527 |
Methods and compositions for providing photoresist with improved properties for contacting liquids |
Robert Meagley, Ernisse Putna |
2010-03-16 |
| 7459260 |
Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method |
Manish Chandhok, Heidi Cao |
2008-12-02 |
| 7442487 |
Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists |
Heidi Cao, Manish Chandhok |
2008-10-28 |
| 7427463 |
Photoresists with reduced outgassing for extreme ultraviolet lithography |
Heidi Cao |
2008-09-23 |
| 7241560 |
Basic quencher/developer solutions for photoresists |
Shan Clark, Kim-Khanh Ho, James S. Clarke, Ernisse Putna, Robert Meagley |
2007-07-10 |
| 7226718 |
Non-outgassing low activation energy resist |
Heidi Cao, Jeanette M. Roberts |
2007-06-05 |
| 7147986 |
Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages |
Heidi Cao |
2006-12-12 |
| 7147985 |
Resist compounds including acid labile groups having hydrophilic groups attached thereto |
Ernisse Putna |
2006-12-12 |
| 7125793 |
Method for forming an opening for an interconnect structure in a dielectric layer having a photosensitive material |
Huey-Chiang Liou |
2006-10-24 |
| 7118847 |
Polymer and photoresist compositions |
Charles R. Szmanda, George G. Barclay, Peter Trefonas, III |
2006-10-10 |
| 7105266 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
George G. Barclay |
2006-09-12 |
| 7022454 |
Monomers, polymers, methods of synthesis thereof and photoresist compositions |
George G. Barclay, Joseph Mattia |
2006-04-04 |
| 7005227 |
One component EUV photoresist |
Heidi Cao |
2006-02-28 |
| 6864192 |
Langmuir-blodgett chemically amplified photoresist |
Huey-Chiang Liou, Hai Deng, Hok-Kin Choi |
2005-03-08 |
| 6849381 |
Copolymers and photoresist compositions comprising same |
George G. Barclay, Stefan J. Caporale, Zhibiao Mao, Joseph Mattia |
2005-02-01 |
| 6777157 |
Copolymers and photoresist compositions comprising same |
George G. Barclay, Stefan J. Caporale, Zhibiao Mao, Joseph Mattia |
2004-08-17 |
| 6680159 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
George G. Barclay |
2004-01-20 |
| 6599677 |
Polymer and photoresist compositions |
Charles R. Szmanda, George G. Barclay, Peter Trefonas, III |
2003-07-29 |
| 6492086 |
Phenolic/alicyclic copolymers and photoresists |
George G. Barclay, Ashish A. Pandya, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao |
2002-12-10 |
| 6406828 |
Polymer and photoresist compositions |
Charles R. Szmanda, George G. Barclay, Peter Trefonas, III |
2002-06-18 |
| 6306554 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
George G. Barclay |
2001-10-23 |