Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10459338 | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging | Paul A. Nyhus, Eungnak Han, Swaminathan Sivakumar | 2019-10-29 |
| 9625815 | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging | Paul A. Nyhus, Eungnak Han, Swaminathan Sivakumar | 2017-04-18 |
| 7687225 | Optical coatings | Sergei Koveshnikov, Juan E. Dominguez, Kyle Flanigan | 2010-03-30 |
| 7678527 | Methods and compositions for providing photoresist with improved properties for contacting liquids | Robert Meagley, Wang Yueh | 2010-03-16 |
| 7507521 | Silicon based optically degraded arc for lithographic patterning | Kyle Flanigan, Juan E. Dominguez, Sergei Koveshnikov | 2009-03-24 |
| 7391501 | Immersion liquids with siloxane polymer for immersion lithography | Hai Deng, Yueh-Chih Wang, Huey-Chiang Liou, Hok-Kin Choi, Robert Meagley | 2008-06-24 |
| 7361455 | Anti-reflective coatings | Shan Clark, Robert Meagley | 2008-04-22 |
| 7241560 | Basic quencher/developer solutions for photoresists | Shan Clark, Kim-Khanh Ho, James S. Clarke, Wang Yueh, Robert Meagley | 2007-07-10 |
| 7147985 | Resist compounds including acid labile groups having hydrophilic groups attached thereto | Wang Yueh | 2006-12-12 |