Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11309321 | Integrated structures containing vertically-stacked memory cells | Haitao Liu, Chandra Mouli, Dimitrios Pavlopoulos, Guangyu Huang | 2022-04-19 |
| 11018149 | Building stacked hollow channels for a three dimensional circuit device | Zhenyu Lu, Roger Linsday | 2021-05-25 |
| 10892268 | Integrated structures containing vertically-stacked memory cells | Haitao Liu, Chandra Mouli, Dimitrios Pavlopoulos, Guangyu Huang | 2021-01-12 |
| 10381365 | Integrated structures containing vertically-stacked memory cells | Haitao Liu, Chandra Mouli, Dimitrios Pavlopoulos, Guangyu Huang | 2019-08-13 |
| 9761599 | Integrated structures containing vertically-stacked memory cells | Haitao Liu, Chandra Mouli, Dimitrios Pavlopoulos, Guangyu Huang | 2017-09-12 |
| 7687225 | Optical coatings | Juan E. Dominguez, Kyle Flanigan, Ernisse Putna | 2010-03-30 |
| 7507521 | Silicon based optically degraded arc for lithographic patterning | Kyle Flanigan, Juan E. Dominguez, Ernisse Putna | 2009-03-24 |
| 6896727 | Method of determining nitrogen concentration within a wafer | — | 2005-05-24 |
| 6794227 | Method of producing an SOI wafer | — | 2004-09-21 |
| 6673147 | High resistivity silicon wafer having electrically inactive dopant and method of producing same | Oleg Kononchuk, Zbigniew J. Radzimski, Neil A. Weaver | 2004-01-06 |
| 6669775 | High resistivity silicon wafer produced by a controlled pull rate czochralski method | Oleg Kononchuk, Zbigniew J. Radzimski, Neil A. Weaver | 2003-12-30 |
| 6669777 | Method of producing a high resistivity silicon wafer utilizing heat treatment that occurs during device fabrication | Oleg Kononchuk, Zbigniew J. Radzimski, Neil A. Weaver | 2003-12-30 |
| 6649427 | Method for evaluating impurity concentrations in epitaxial susceptors | Douglas G. Anderson | 2003-11-18 |
| 6632688 | Method for evaluating impurity concentrations in epitaxial reagent gases | — | 2003-10-14 |
| 6630363 | Method for evaluating impurity concentrations in unpolished wafers grown by the Czochralski method | Douglas G. Anderson | 2003-10-07 |
| 6620632 | Method for evaluating impurity concentrations in semiconductor substrates | Craig Rein | 2003-09-16 |
| 6583024 | High resistivity silicon wafer with thick epitaxial layer and method of producing same | Oleg Kononchuk, Zbigniew J. Radzimski, Neil A. Weaver | 2003-06-24 |
| 6576501 | Double side polished wafers having external gettering sites, and method of producing same | David Beauchaine, Timothy L. Brown, Romony San | 2003-06-10 |
| 6565652 | High resistivity silicon wafer and method of producing same using the magnetic field Czochralski method | Oleg Kononchuk, Zbigniew J. Radzimski, Neil A. Weaver | 2003-05-20 |
| 6423556 | Method for evaluating impurity concentrations in heat treatment furnaces | Douglas G. Anderson | 2002-07-23 |
| 6346460 | Low cost silicon substrate with impurity gettering and latch up protection and method of manufacture | Oleg Kononchuk | 2002-02-12 |
| 6339011 | Method of forming semiconductive active area having a proximity gettering region therein and method of processing a monocrystalline silicon substrate to have a proximity gettering region | Fernando Gonzalez | 2002-01-15 |
| 5943552 | Schottky metal detection method | Howard Mollenkopf | 1999-08-24 |