Issued Patents All Time
Showing 1–25 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10754249 | Coating compositions for photolithography | Michael K. Gallagher, Owendi Ongayi | 2020-08-25 |
| 10481494 | Coating compositions for use with an overcoated photoresist | Vipul Jain, Owendi Ongayi, Suzanne M. Coley | 2019-11-19 |
| 10365562 | Coating compositions for use with an overcoated photoresist | Owendi Ongayi, Vipul Jain, Suzanne M. Coley | 2019-07-30 |
| 10261418 | Coating compositions for use with an overcoated photoresist | Gerald B. Wayton | 2019-04-16 |
| 9696627 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Jinrong Liu, Cong Liu, Doris Kang, Cheng-Bai Xu | 2017-07-04 |
| 9690199 | Coating compositions for photolithography | Michael K. Gallagher, Owendi Ongayi | 2017-06-27 |
| 9429844 | Coating compositions for use with an overcoated photoresist | Gerald B. Wayton | 2016-08-30 |
| 9323154 | Coating compositions for photolithography | Michael K. Gallagher, Owendi Ongayi | 2016-04-26 |
| 9244352 | Coating compositions for use with an overcoated photoresist | Gerald B. Wayton, Vipul Jain, Cong Liu, Suzanne M. Coley, Owendi Ongayi | 2016-01-26 |
| 8968981 | Coating compositions for use with an overcoated photoresist | Vipul Jain, Owendi Ongayi, Suzanne M. Coley | 2015-03-03 |
| 8501383 | Coating compositions for use with an overcoated photoresist | Vipul Jain, Cong Liu, Suzanne M. Coley, Owendi Ongayi | 2013-08-06 |
| 8455178 | Coating compositions for photolithography | Michael K. Gallagher, Vipul Jain, Owendi Ongayi | 2013-06-04 |
| 8373241 | Antireflective hard mask compositions | Dana Gronbeck, Amy M. Kwok, Chi Q. Truong, Michael K. Gallagher | 2013-02-12 |
| 8142988 | Coating compositions for use with an overcoated photoresist | Edward K. Pavelchek | 2012-03-27 |
| 8026037 | Si-polymers and photoresists comprising same | Tao Zhang, Jaihyoung Lee | 2011-09-27 |
| 7700256 | Phenolic/alicyclic copolymers and photoresists | George G. Barclay, Ashish A. Pandya, Wang Yueh, Gary Ganghui Teng, Zhibiao Mao | 2010-04-20 |
| 7605439 | Antireflective hard mask compositions | Dana Gronbeck, Amy M. Kwok, Chi Q. Truong, Michael K. Gallagher | 2009-10-20 |
| 7390609 | Polymers and photoresists comprising same | Tao Zhang, Jaihyoung Lee | 2008-06-24 |
| 6907432 | Method and system for recycling materials | Charles R. Szmanda, Peter Trefonas, III, Richard C. Hemond, Mark S. Thirsk, Leo L. Linehan | 2005-06-14 |
| 6858379 | Photoresist compositions for short wavelength imaging | Charles R. Szmanda, Gary N. Taylor, James F. Cameron, Gerhard Pohlers | 2005-02-22 |
| 6844270 | Polymers and photoresist compositions for short wavelength imaging | Sungseo Cho | 2005-01-18 |
| 6787286 | Solvents and photoresist compositions for short wavelength imaging | Charles R. Szmanda | 2004-09-07 |
| 6645695 | Photoresist composition | — | 2003-11-11 |
| 6599951 | Antireflective porogens | Michael K. Gallagher | 2003-07-29 |
| 6596405 | Antireflective porogens | Michael K. Gallagher | 2003-07-22 |