Issued Patents All Time
Showing 1–25 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12228859 | Pattern formation methods | Choong-Bong Lee, Stefan J. Caporale, Jason A. DeSisto, Jong Keun Park, Cong Liu +1 more | 2025-02-18 |
| 11846885 | Topcoat compositions and photolithographic methods | Cong Liu, Doris Kang, Deyan Wang, Mingqi Li, Chunyi Wu | 2023-12-19 |
| 11754927 | Photoresist pattern trimming compositions and pattern formation methods | Irvinder Kaur, Colin Liu, Xisen Hou, Kevin Rowell, Mingqi Li | 2023-09-12 |
| 11506981 | Photoresist pattern trimming compositions and pattern formation methods | Xisen Hou, Irvinder Kaur, Cong Liu, Mingqi Li, Kevin Rowell | 2022-11-22 |
| 11106137 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Cong Liu, Mingqi Li, Joon Seok Oh, Doris Kang +2 more | 2021-08-31 |
| 10809616 | Cholate photoacid generators and photoresists comprising same | Emad Aqad, Mingqi Li, Joseph Mattia | 2020-10-20 |
| 10719014 | Photoresists comprising amide component | Cong Liu, Chunyi Wu, Gerhard Pohlers, Gregory P. Prokopowicz, Mingqi Li | 2020-07-21 |
| 10684549 | Pattern-formation methods | Kevin Rowell, Cong Liu, Irvinder Kaur, Xisen Hou, Mingqi Li | 2020-06-16 |
| 10670965 | Polymers and photoresist compositions | Emad Aqad, Cong Liu, Mingqi Li | 2020-06-02 |
| 10578969 | Photoresist topcoat compositions and methods of processing photoresist compositions | Cong Liu, Doris Kang, Deyan Wang, Mingqi Li, Irvinder Kaur | 2020-03-03 |
| 10558122 | Compositions comprising sulfonamide material and processes for photolithography | Deyan Wang, Chunyi Wu, George G. Barclay | 2020-02-11 |
| 10539870 | Photoresists comprising carbamate component | William Williams, III, Cong Liu | 2020-01-21 |
| 10527934 | Photoresists comprising ionic compound | Gerhard Pohlers, Cong Liu, Chunyi Wu | 2020-01-07 |
| 10466588 | Sulfonyl photoacid generators and photoresists comprising same | Cong Liu | 2019-11-05 |
| 10359698 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | Deyan Wang, George G. Barclay | 2019-07-23 |
| 10222699 | Compositions and processes for immersion lithography | Deyan Wang, George G. Barclay | 2019-03-05 |
| 10221131 | Acid generator compounds and photoresists comprising same | Irvinder Kaur, Cong Liu | 2019-03-05 |
| 10197918 | Photoresist topcoat compositions and methods of processing photoresist compositions | Cong Liu, Doris Kang, Deyan Wang, Mingqi Li, Irvinder Kaur | 2019-02-05 |
| 10162266 | Photoresist pattern trimming methods | Gerhard Pohlers, Kevin Rowell | 2018-12-25 |
| 9996008 | Photoresist pattern trimming methods | — | 2018-06-12 |
| 9869933 | Pattern trimming methods | Kevin Rowell, Cong Liu, Irvinder Kaur, Jong Keun Park | 2018-01-16 |
| 9760011 | Pattern trimming compositions and methods | Kevin Rowell, Cong Liu, Irvinder Kaur, Jong Keun Park | 2017-09-12 |
| 9753370 | Multiple-pattern forming methods | Chang-Young Hong, Jung Woo Kim, Cong Liu, Shintaro Yamada, Lori Anne Joesten +3 more | 2017-09-05 |
| 9720321 | Lactone photoacid generators and resins and photoresists comprising same | Emad Aqad, Mingqi Li, Cong Liu | 2017-08-01 |
| 9696627 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Jinrong Liu, Cong Liu, Doris Kang, Anthony Zampini | 2017-07-04 |