Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12234369 | Photoresist topcoat compositions and methods of processing photoresist compositions | Irvinder Kaur, Joshua Kaitz, Mingqi Li, Doris Kang, Xisen Hou +1 more | 2025-02-25 |
| 11940731 | Photoresist topcoat compositions and methods of processing photoresist compositions | Irvinder Kaur, Cong Liu, Doris Kang | 2024-03-26 |
| 11846885 | Topcoat compositions and photolithographic methods | Cong Liu, Doris Kang, Deyan Wang, Cheng-Bai Xu, Mingqi Li | 2023-12-19 |
| 11809077 | Photoresist compositions and pattern formation methods | Thomas Cardolaccia, Jason A. DeSisto, Choong-Bong Lee, Mingqi Li, Tomas Marangoni +2 more | 2023-11-07 |
| 10719014 | Photoresists comprising amide component | Cong Liu, Gerhard Pohlers, Gregory P. Prokopowicz, Mingqi Li, Cheng-Bai Xu | 2020-07-21 |
| 10558122 | Compositions comprising sulfonamide material and processes for photolithography | Deyan Wang, George G. Barclay, Cheng-Bai Xu | 2020-02-11 |
| 10527934 | Photoresists comprising ionic compound | Gerhard Pohlers, Cong Liu, Cheng-Bai Xu | 2020-01-07 |
| 10133179 | Pattern treatment methods | Jin Wuk Sung, Mingqi Li, Jong Keun Park, Joshua Kaitz, Vipul Jain +1 more | 2018-11-20 |
| 9507260 | Compositions and processes for photolithography | Deyan Wang, Cheng-Bai Xu, George G. Barclay | 2016-11-29 |
| 9475763 | Photoresist comprising nitrogen-containing compound | Cong Liu, Gerhard Pohlers, Gregory P. Prokopowicz, Cheng-Bai Xu | 2016-10-25 |
| 9436082 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Shintaro Yamada, Cong Liu, Mingqi Li, Joon Seok Oh +2 more | 2016-09-06 |
| 9274427 | Compositions and processes for photolithography | Deyan Wang | 2016-03-01 |
| 9122159 | Compositions and processes for photolithography | Deyan Wang | 2015-09-01 |
| 9012128 | Photoresist and coated substrate comprising same | Deyan Wang, Cong Liu, Gerhard Pohlers, Cheng-Bai Xu, George G. Barclay | 2015-04-21 |
| 9005880 | Compositions comprising sulfonamide material and processes for photolithography | Deyan Wang, George G. Barclay, Cheng-Bai Xu | 2015-04-14 |
| 8927190 | Photoresist comprising nitrogen-containing compound | Cong Liu, Gerhard Pohlers, Gregory P. Prokopowicz, Cheng-Bai Xu | 2015-01-06 |
| 8883400 | Compositions and processes for photolithography | Deyan Wang | 2014-11-11 |
| 8808967 | Compositions and processes for photolithography | Deyan Wang | 2014-08-19 |
| 8748080 | Compositions and processes for photolithography | Deyan Wang | 2014-06-10 |
| 8722825 | Surface active additive and photoresist composition comprising same | Deyan Wang, Cong Liu, Gerhard Pohlers, Cheng-Bai Xu, George G. Barclay | 2014-05-13 |
| 8603728 | Polymer composition and photoresist comprising the polymer | Gregory P. Prokopowicz, Gerhard Polhers, Mingqi Li, Cong Liu, Cheng-Bai Xu | 2013-12-10 |
| 8241832 | Compositions and processes for photolithography | Deyan Wang | 2012-08-14 |
| 7662981 | Leveler compounds | Deyan Wang, Robert D. Mikkola, George G. Barclay | 2010-02-16 |
| 7510639 | Leveler compounds | Deyan Wang, Robert D. Mikkola, George G. Barclay | 2009-03-31 |
| 7128822 | Leveler compounds | Deyan Wang, Robert D. Mikkola | 2006-10-31 |